SU-8 was developed by IBM as a thick negative photoresist targeted to the fabrication of molds for electroplating. The epoxy-based negative photoresist has some remarkable properties. First of all, it has a wide range of coating thicknesses: layers from several hundreds of nanometers up to seve...
Bogdanov AL (2000) Use of SU-8 negative photoresist for optical mask manufacturing. In: Proceedings of SPIE International Society for Optical Engineering 3999, pp 1215–1225A.L. Bogdanov, Use of SU-8 negative photoresist for optical mask manu- facturing, Proc. SPIE (2000) 1215-1225....
MEMS inertial switch is a device that controls the circuits on and off by detectingthe external acceleration.It is widely used in test control,consumer electronics,biomedicaland other fields.Previous studies on inertial switches tended t...
Yun-Ju Chuang, Fan-Gang Tseng, and Wei-Keng Lin, "Reduction of Diffraction Effect of UV Exposure on SU-8 Negative Thick Photoresist by Air Gap Elimination", to be published in J. Microsystem Technologies.Chuang YJ, Tseng TG, Lin WK (2002) Reduction of diffraction effect of UV exposure ...
ImmunosensingSU-8, an epoxy based negative photoresist is extensively used as a structural material for the fabrication of microelectro-mechanical systems and in microelectronics technology. However, the possible applications of SU-8 for biosensing have not been explored much, mainly because of the ...
This article gives an overview of the use of SU-8 negative epoxy photoresist in microfabrication applications. SU-8 is outstanding in terms of attainable thicknesses and aspect ratios. A short review is given of the relevant material properties, the available single-layer processing techniques and ...
SU8 epoxy is a high-fidelity, biocompatible, negative photoresist material with an ever-growing range of innovative uses. Microwell arrays Cell separations Cellular biophysics Biomedical engineering Micro Molding Biodegradable implants Telecommunications ...
5.Lorenz H;Despont M;Fahrni N High-aspect ratio,ultrathick,negative-tone near-UV photoresist and its application for MEMS 1998 6.Bogdanov L A;Peredkov S S Use of SU-8 photoresist for very high aspect ratio x-ray lithography [外文期刊] 2000(1/4) 7.Bertsch A;Lorenz L;Renaud P 3D mi...
SU-8 negative photoresist has been extensively employed in the fabrication of microfluidics and microelectromechanical systems. This is due to its advantages including ease of fabrication using limited equipment, biocompatibility, excellent chemical resistance, and compatibility with silicon processing. In ...
SU-8 photoresist is an epoxy-based negative photoresist. It has parts that crosslink when exposed to ultraviolet light and the remaining is soluble. The remaining portion can be washed away during the development process. The name SU-8 comes from the presence of eight epoxy groups per moiety,...