Effects of carbon content on microstructures and magnetic properties of annealed or solution treated Fe-Cr-Ni-C alloysExperimental/ carbonchromium alloyscrystal microstructureferromagnetic materialsiron alloysmagnetic permeabilitynickel alloysparamagnetic materials...
SOLUTION ANNEALED AND THERMALLY TREATED ALLOY 600 PREFERENTIAL INTERGRANULAR OXIDATION: A COMPARISON Burke, Solution-annealed and thermally-treated Alloy 600 preferential intergranular oxidation: a comparison, Proceedings of the 17th International Symposium on ... G Bertali,F Scenini,P Gilles,... - ...
Device fabrication A 100 nm-thick Si substrate with a thermally grown SiO2layer was precleaned by sonication with acetone and 2-propanol for 10 min each, and then treated with UV-O3for 30 min. A self-assembled monolayer (SAM) of 2-(phenylhexyl)trimethoxysilane was formed on the surf...
After drying, the substrates were treated with UV/Ozone for 30 min and then moved into a N2 filled glovebox. The pristine organic semiconductor layer was spin coated onto glass substrate from the solution (3 mg/ml in CB) at 2000 rpm and annealed at different temperatures for 1 h...
The spectra were corrected by subtracting the signal from the buffer, smoothed using the FFT filter (Jasco Software, Tokyo, Japan), and were treated as described previously (37). Fluorescence spectroscopy Fluorescence measurements were performed with an FP-750 spectrofluorimeter (Jasco, Tokyo, Japan...
(forthePCBMrichlayerformedbya2mgml −1 PCBM solution).Finally,toobtainmoreuniformandsmoothfilmswithbettercontactofCa/PCBM andBHJ/PCBMinterfaces,thefilmswerethermallyannealedat120 ◦ Cfor10minafterspin coatingthePCBMrichlayer,leadingtoanaveragePCEenhancementfrom4.83%to5.17% (thebestPCEwas5.31%). ...
In this work, the mechanical properties and microstructure evolution of the as-annealed and solution treated 2195 alloy specimens under dynamic compression were studied and compared. The dynamic compression tests were performed at the strain rates of 1400 s 1 , 2200 s 1 , 3400 s 1 , and 4500...
Annealed; treated with fluoride-free prepolymer organosilane solution; weatherproofingdoi:US6300028 B1The present invention also provides a cost-effective method of forming the improved a-Si:H photoreceptors. The method comprises stabilizing an a-Si:H photoreceptor member against environmental degradation ...
The ITO substrates were treated with oxygen plasma for 5 min before use to improve the wettability of following solution. For the HTL, PEDOT:PSS (Clevios PVP AI 4083) was deposited on the ITO substrate by spin-casting at 3000 rpm for 30 s and annealed using a hot plate at 150...
However, precursor systems when the corresponding films were treated at low T1. As mentioned earlier, solution-processed layers from MOS precursors require a high-T treatment to remove impurities as charge trap sites and induce crystallization of the MOS phases for high-performance TFTs1. Adama...