我们利用射频溅镀(RF-sputtering)成长具有载子局限结构之氧化锌(ZnO)异质pn接面发光二极管,具有二氧化硅电流阻挡层(SiO … gipo.ntu.edu.tw|基于5个网页 2. 射频磁控溅镀法 本实验采用射频磁控溅镀法(rf-sputtering)在p-type矽基板上镀制钛酸铅钡绝缘层薄膜,并在其上再镀制一层铁酸铋铁铁电薄膜, … ...
RF SPUTTERING Radio Frequency Sputter deposition of insulating materials cannot be done with DC power. Materials such as oxides, nitrides, and ceramics have very large DC impedance and require prohibitively high voltages to ignite and maintain a plasma. Luckily, the impedance of these materials ...
A new design of a ceramic catalyst support composed of several substrate components enables the use of rf-sputtering for depositing a PtRh alloy catalytic thin film. In the pre-treatment of the substrate a layer of 纬-Al 2 O 3 was deposited on each ceramic component by the wash-coat ...
有人知道RF sputtering system仪器如何使用？以及上边的各个表格以及按钮对应的东西？谢谢~...
必应词典为您提供RF-Sputtering-Deposition的释义,网络释义: 射频溅镀;射频溅镀简介;
A cylindrical cathode is used as a vacuum chamber to permit sputtering by means of an rf potential on all sides of a workpiece located coaxially within the chamber. Both insulators and conductors may
4sputteringA forming-free SiN-based resistive switching memory (RSM) device has been successfully realized using an RF sputtering method. With a 10-nm thick SiN film, the memory device showed forming-free switching behavior under 卤2V/100ns. The conduction mechanisms at low- and high-resistance...
Influence of sputtering pressure on physical structure of AlN thin films prepared on Y-128° LiNbO3 by rf magnetron sputtering c-axis-oriented aluminum nitride (AlN) films were successfully prepared on a Y-128° LiNbO3 substrate by rf magnetron sputtering. The dependence between sp... L Wu,S...
adovani S, D'Acapito F, Cattaruzza , De orenzi a., onella F, Mattei G, Maurizio C, Mazzoldi P, Montagna M, Ronchin S, Tosello C and Ferrari M, "Metal nanocluster formation in silica films prepared by rf-sputtering: an experimental study," The European Physical Journal B - ...
In general, the thin film synthesis by RF sputtering is smoother and has higher packing density in contrast to DC sputtering. The RF sputtering [34] also permits a large area of film at low substrate temperature and offers better adhesion, effective uniformity, and controlled thickness on the ...