doi:10.1007/978-1-4613-3748-5_2David A. TirrellCarnegie-Mellon UniversityMelvin P. ZussmanCarnegie-Mellon UniversityJenn S. ShihCarnegie-Mellon UniversityJohn F. BrandtCarnegie-Mellon UniversitySpringer US
PURPOSE: Provided are a photoresist polymer and a photoresist composition comprising the same, which form a micropattern up to 50 nm capable of being used in a photolithographic process with an EUV light source. CONSTITUTION: The photoresist polymer comprises a repeating unit represented by the formu...
PURPOSE: Provided are a compound, a polymer compound containing the repeating unit of the compound, a resist material containing the polymer compound as a base resin which has a satisfactory etching resistance, excellent substrate adhesion and developer affinity, improved sensitivity and resolution and ...
Photopolymer composed of a photosensitive polymer binder bearing a chalcone moiety in the repeating unitdoi:10.1080/15980316.2006.9651999New photopolymers were designed and prepared using the photosensitive polymer binders. Holographic gratings were successfully fabricated in these photopolymer samples by a ...
A linear water-soluble quaternary ammonium polymer having a homopolymeric chain of repeating unit of general formula (I): where each of R1 and R... R Freitag,C Wandrey 被引量: 0发表: 2003年 加载更多研究点推荐 Water-soluble quaternary ammonium polymer ...
CONSTITUTION: The photosensitive resin precursor composition comprises a polymer comprising a structural unit represented by the formula 1 as a main component; at least two kinds of photoacid generators; and an alkoxymethyl group-containing compound, wherein R1 is a divalent to octavalent organic ...
light exposing photoresist polymer selected from a ROMA-type polymer including a Ring-Opened Maleic Anhydride repeating unit; COMA-type copolymer including Cyclo-Olefin repeating unit, Maleic Anhydride repeating unit and methacrylate or acrylate repeating unit, baking US 20070196772 A1 Abstract A method ...
c thin film element Nitrogen-containing fused-ring compound, polymer comprising a nitrogen-containing fused-ring repeating unit, organic thin film, and organic thin film elementNitrogen-containing fused-ring compound, polymer comprising a nitrogen-containing fused-ring repeating unit, organic thin film,...
A polymer having a repeating unit comprising a copolymer of butadiene sulfone and maleic anhydride, and a chemically amplified resist composition comprising the polymer. The resist composition includes a photosensitive polymer having a first repeating unit comprising a copolymer of butadiene sulfone and ...
A polymer having a repeating unit comprising a copolymer of butadiene sulfone and maleic anhydride, and a chemically amplified resist composition comprising the polymer. The resist composition includes a photosensitive polymer having a first repeating unit comprising a copolymer of butadiene sulfone and ...