The present invention relates toThe following equation (I)A,BAR1Ar2Ar3 and AR4.MNO and PA polymer having at least one asymmetric structural unit ofTheir preparation methodsElectronic and optoelectronic devicesOrganic electroluminescent devicesIt relates to their use in so-called OLED (OLED = organic...
Figure 1 shows the chemistry for the repeating unit of what is generically referred to as a silicone polymer. Analyzing filler content: the process is considered simple. But things aren't always as they seem The mass increment of the repeating unit is 74 Da, and corresponds to a fragment of...
PURPOSE: Provided are a photoresist polymer and a photoresist composition comprising the same, which form a micropattern up to 50 nm capable of being used in a photolithographic process with an EUV light source. CONSTITUTION: The photoresist polymer comprises a repeating unit represented by the formu...
aA polymer is a generic term used to describe a substantially long molecule. This long molecule consists of structural units and repeating units strung together through chemical bonds. The process of converting these units to a polymer is called polymerization. 聚合物是用于的一个一般术语描述一个极大...
A、The structure of repeating unit is not the same as that of the monomer. B、The structural unit of polymer chain is always the same as its repeating unit. C、In some cases, the structure of repeating unit is same as that of structural unit. D、In some cases, the repeating unit cons...
A linear water-soluble quaternary ammonium polymer having a homopolymeric chain of repeating unit of general formula (I): where each of R1 and R2 independently represents a member selected from the group consisting of linear or branched alkyl, hydroxyalk
Photopolymer composed of a photosensitive polymer binder bearing a chalcone moiety in the repeating unitdoi:10.1080/15980316.2006.9651999New photopolymers were designed and prepared using the photosensitive polymer binders. Holographic gratings were successfully fabricated in these photopolymer samples by a ...
PROBLEM TO BE SOLVED: To improve the adhesion of an unexposed part and to suppress the reduction of film thickness without deteriorating dry etching resistance by incorporating a compd. that generates an acid when degraded by irradiation with active light, etc., and a resin contg. specified rep...
The results identify that MUC5B has a beaded structure repeating along the polymer axis and suggest that these repeating motifs arise from distinct glycosylation patterns. Moreover, we demonstrate that the conformation of these highly entangled linear polymers is sensitive to calcium concentration and ...
Okada M. et al., " Chemical Synthesis of Polysaccharides III. A Synthetic Polysaccharide Having One Hydroxyl Group in Its Repeating Unit, 3,4-Dideoxy-(1→6)-α-DL-threo-hexopyranan ", Polymer journal 15(11):821-826 (1983).Okada M. et al., " Chemical Synthesis of Polysaccharides III....