During transmission or acquisition images are corrupted by impulse noise .In this paper propose efficient denoising and VLSI architecture for removal of random valued impulse noise in an images .In order to achieve a low cost proposed a low-complexity VLSI architecture. Here a decision-tree-based ...
In 2019 IEEE International Conference on Distributed Computing, VLSI, Electrical Cir- cuits and Robotics (DISCOVER), pages 1–6. IEEE, 2019. 3, 6, 7, 8 [2] Tim Brooks, Ben Mildenhall, Tianfan Xue, Jiawen Chen, Dillon Sharlet, and Jonathan T Barron....
For real-time embedded applications, the VLSI implementation of switching median filter for impulse noise removal is necessary. In this paper, an efficient very large scale integration (VLSI) and field programmable gate array (FPGA) based... T Satyanarayana,A. Chandra 被引量: 0发表: 2013年 AD...
4775550Surface planarization method for VLSI technology1988-10-04Chu et al.427/38 Other References: Wolf, "Silicon Processing for the LVSI Era, vol. 2: Process Integration," Lattice Press, pp. 179-182, 1990. Ichikawa, et al., "Multilevel Interconnect System for 0.35um CMOS Lsi's with Met...
Wolf and Tauber, Silicon Processing for the VLSI Era: vol. 1, 1986, Lattice Press, pp. 429-455. Primary Examiner: TOLEDO, FERNANDO L Attorney, Agent or Firm: SAILE ACKERMAN LLC (POUGHKEEPSIE, NY, US) Claims: What is clashed is: ...
Biosignals have quite low signal-to-noise ratio and are often corrupted by different types of artifacts and noises originated from both external and internal sources. The presence of such artifacts and noises poses a great challenge in proper analysis of
第十讲 Hidden Surface Removal HiddenSurfaceRemoval (隐藏面消除)(Chap16of4thedition)LiGuiqingSouthChinaUniversityofTechnology NoLinesRemoved HiddenLinesRemoved HiddenSurfacesRemoved Agenda Hiddensurfaceremoval(消隐)Terminologies（术语介绍）Imagespace:Z-bufferalgorithm (图像空间算法）Objectspace:backsurfaceculling&...
etching residue removal and substrate compatibility with chemicals employed in wet processing is becoming more and more critical for obtaining acceptable yield in very large scale integration (VLSI) and ultra large scale integration (ULSI) processes. The composition of such etching residue is generally ...
Sze, VLSI Technology, Mc Graw-Hill, 1988, p. 197. Primary Examiner: EVERHART, BYRON S Attorney, Agent or Firm: SKJERVEN, MORRILL, MACPHERSON, (SAN JOSE, CA, US) Claims: We claim: 1. A method for removing a dielectric from the surface of a semiconductor body, wherein the dielectric ...
Liow, Tsung-Yang et al., “Strained N-Channel FinFETs with 25 nm Gate Length and Silicon-Carbon Source/Drain Regions for Performance Enhancement”, VLSI Technology, 2006, Digest of Technical Papers, 2006 Symposium on VLSI Technology 2006; pp. 56-57. ...