SPIE -- InL Soc. Opt Eng. (USA), vol. 923, pp. 194--200 (1988). (Electron-Beam, X-Ray, and Ion- Beam Technology: Submicrometer Lithographies VII, Santa Clara, CA. USA. 2-4 March 1988) A three layer resist process for gate lift-off on gallium arsenide MIMICs by electron beam ...