This paper discusses the relative merits of traditional PAG blend resist approach vs a novel Polymer-bound PAG resist approach. In looking at EUV exposures it is shown that the Polymer-bound PAG approach possesses advantages in LWR and Resolution over a PAG blend resist approach. The Polymer-...
To reduce line edge roughness, polymer bound PBGs and polymer bound PAGs were investigated in the PDL resist formulations. The synthesis, purification, analysis, and functional performance of various polymers containing PBG or PAG monomers are described herein. Both polymer bound PBG with monomeric ...
This may suggest that even at the lowest sensitizer loading studied the energy of the secondary electrons is already efficiently transferred to the PAGs.Roel GronheidIMECKapeldreef 75Alessandro Vaglio PretIMECKapeldreef 75Benjamen RathsackIMECKapeldreef 75Joshua Hooge...
Photoacid generators (PAGs) have been widely used as a key component for improving photoresist performance. The acid diffusion influences on the photoresist characteristics of resolution and line edge roughness (LER). The PAG bound polymer resist has been a key component for solving the problems ...
While PAGs for the 248 nm or DUV application are plenty, there is little effort in the arena of i-line PAGs. Typically, energy transfer in i-line lithography is achieved by using a DUV PAG in conjunction with an i-line energy transfer agent called sensitizer. This combination works very...
In conventional I-line resist, it is the DNQ molecule. In chemically amplified resists, it is the photoacid generator or the PAG. This component acts as the link between the exposure tool and the photoresist system. While PAGs for the 248 nm or DUV application are plenty, there is ...
This may suggest that even at the lowest sensitizer loading studied the energy of the secondary electrons is already efficiently transferred to the PAGs.Roel GronheidAlessandro Vaglio PretBenjamen RathsackJoshua HoogeSteven ScheerKathleen Nafus