Experimental/ chemical vapour depositionfission reactor materialsisotope relative abundanceisotope separationtime of flight mass spectra/ isotope separation methodphysical vapor depositioneffusive emissionheated molybdenum boatlithium isotopeslithium fluorideAn isotope separation technique using effusive emission of ...
deposition n. 1.[U]沉积 2.[C]沉积物 3.[U]罢免 4.[C]证词 vapour n.[C,U]蒸气,潮气,雾气 physical adj. 1. 物质的(与道德的或精神的相对) 2. 身体的;肉体的 3. 自然规律的;按自然法则的 4. 物质世界的自然特徵的 5. 物理的;物理学的 n.[C] 1.【口】体格 physical 【医】 物理...
Purpose: The goal of this paper is presentation of comparative analysis results concerning the most perspective technology groups included in common called Physical Vapour Deposition (PVD) during the next 20 years. Design/methodology/approach: In the framework of carried out research the value of the...
Mattox, Handbook of Physical Vapor Deposition (PVD) Processing, Noyes, Westwood, NJ, USA, 1998. OLED fabrication by using a novel planar evaporation technique Housed in a large stainless-steel case that's available uncoated or treated with black physical vapor deposition (PVD), the bridges of ...
A new nonlinear optical material urea L_malic acid film (ULMA) was successfully prepared byphysical vapour deposition(PVD) at appropriate heating temperature. 通过控制加热温度,采用物理气相沉积(PVD)技术制备了新型有机非线性光学材料L-苹果酸脲(ULMA)的晶体薄膜,该薄膜保持了晶体良好的非线性光学性质。
deposition speeds, large components, and ease of exploitation, but do not produce coatings with the same wide variety and quality as CVD, electrodeposition, and PVD. So the selection of thecoating depositiontechnique largely depends on the application. In conclusion, all thedeposition methodshave ...
PVD (Physical vapor deposition) is a technique for creating extremely hard and very thin coatings of a few thousandths of a millimeter. PVD coatings improve the performance and durability of precision components in almost any industrial and consumer good and extend the life of tools used in the ...
This work investigates the compatibility of physical vapour deposition (PVD) techniques with a flexible commercial process, roll-to-roll (R2R), for thermoelectric applications. We demonstrate, on a flexible polyimide substrate, a sputtered BiTe/GeTe TEG with Seebeck coefficient (S) of 140 渭V/K ...
⑵PVD:物理蒸镀涂层(Physical Vapour Deposition)是在200-500℃之间把工件表面镀覆一层耐磨性很高的材料的一种表面处 … www.jd37.com|基于31个网页 2. 物理气相沉积法 为了实现颜色更深且持久坚固的漆面,宾利首先在汽车业内使用“物理气相沉积法(Physical Vapour Deposition)”进行不锈钢镀膜。
The discussion of growth is limited to the physical vapour deposition techniques of laser ablation, sputtering and evaporation. Emphasis is placed on the practical problems of growing epitaxial films in situ and characterising them.年份: 1990