Physical Vapor Deposition(PVD) describes a collection of processes employed to depositthin filmsonto substrates via the physical transference of material. Historically distinguished methods within PVD includeelectron beam evaporation, thermal evaporation, and sputtering. A salient advantage of PVD is its cap...
沪江词库精选physical vapour deposition (PVD)是什么意思、英语单词推荐 物理气相沉积 相似短语 physical vapour deposition (PVD) 物理气相沉积 vapour deposition 气相淀积法,汽相淀积 reactive vapour deposition 反应气相沉积 vapour deposition process 气相沉积法 chemical vapour deposition 化学汽相淀积 ...
Physical vapour deposition (PVD) is the process whereby metals and alloys may be transferred in the vapour state from one source to another. It was known as early as 1857, and since 1912 has been operated in vacuum form, both experimentally and commercially, for applying coatings and ...
The discussion of growth is limited to the physical vapour deposition techniques of laser ablation, sputtering and evaporation. Emphasis is placed on the practical problems of growing epitaxial films in situ and characterising them.年份: 1990
6) physical vapour deposition 物理气相沉积 1. In this paper,the principles,characteristics,application results and trends of development ofphysical vapour depositionare briefly described. 扼要地介绍了物理气相沉积(PVD)的基本原理、特性、应用效果及发展趋势。
View PDFView articleView in ScopusGoogle Scholar [26] L. Baptiste, N. van Landschoot, G. Gleijm, J. Priede, J.S. van Westrum, H. Velthuis, T.-Y. Kim Electromagnetic levitation: A new technology for high rate physical vapour deposition of coatings onto metallic strip Surf. Coat. Tec...
This paper describes the development work carried out on physical vapour deposition of beryllium on zivcaloy appendages, in connection with split spacer fuel bundle design for Pressurised Heavy Water Reactors (PHWR). Beryllium coating on appendages facilitates the formation of zirconium-beryllium eutetic...
Application of coatings by plasma vapour deposition involving electron beam evaporation and ion plating onto green powder metal compacts has been studied as a potential method for encapsulating powder metal products before hot isostatic pressing. The deposition of defect free coatings is essential if ...
The paper is focused on the impact of three types of deposition process (DC magnetron, RF magnetron or Ionized Physical Vapour Deposition – IPVD) on thin films' deposition and microstructure. The effect of the methane fraction in gas discharge was also studied. Films were analysed by EDX, ...
Use of physical vapour deposition (PVD) to enhance surface properties: P Jewsbury, E D Doyle, (Materials Research Labs, Defence Science and Technology Organization, Ascott Vale, Australia), Materials Australia, Vol 22, No 4, 1990, 28–30...