日立HITACHI 4700 FE-SEM Manual说明书用户手册.pdf,日立HITACHI4700FE-SEMManual说明书用户手册用户手册产品说明书使用说明文档安装使用手册HITACHI 4700 FE-SEM COLD FIELD EMISSION 2 STARTING CONDITIONS 3-4 SPECIMEN LOADING 5 SAMPLE INSERTION 6-7 SAMPLE WITHDRAWA
Hitachi_CDSEM_RecipeBuider SPECIFICATIONS ON DATA DEFINITION FILES FOR RECIPE BUILDER V15~ Please read through this manual carefully and then store it in a safe place. ? Before attempting operation, read the safety instructions and precautions carefully. ? Keep this manual in a safe place nearby...
1 Transfer software Automatic and/or manual transfer of measurement result files and image files from a CD-SEM to the Terminal PC. ✓ ✓ 2 Recipe evaluation software Displays performance and error information for each recipe in Excel® ✓ N/A 3 Recipe viewer software Displays all ...
Hitachi High-Technologies 2015 FE-SEM 产品说明书
Manual stage XY: ±2.5 mmImpact stage (conductive type) Maximum 35 mm diam., thickness 10 mm(max. 50 mm sq., thickness 20 mm)* AFM5500MMid-sized Probe Microscope System AFM, DFM, PM Phase, FFM SIS topography, SIS material properties, LM-FFM, VE-AFM, Adhesion, Current, Pico-Current...
The Hitachi Model S-6280 high resolution field emission Scanning Electron Microscope (SEM) is used at Motorola's MOS-12 facility for Critical Dimension (CD) measurements of less than 1 micrometer in size. This tool is used to measure 200-mm diameter wafers with a low accelerating voltage in...
SEMHitachiS4700UserManual：SEM日立s4700用户手册 SEM Hitachi S4700 User Manual General checks 1.Write “Date”, “User” and “Start time” on a user log 2.Check vacuum (IP1: 1.0 x 10-8 Pa, IP2: 1.0 x 10-7 Pa, IP3: 1.0 x 10-6 Pa, S.C.(Pe): L x 10-3 Pa, S.C....
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1 Transfer software Automatic and/or manual transfer of measurement result files and image files from a CD-SEM to the Terminal PC. ✓ ✓ 2 Recipe evaluation software Displays performance and error information for each recipe in Excel® ✓ N/A 3 Recipe viewer software Displays all recipe...
A critical dimension scanning electron microscope (CD-SEM) executes position checking by pattern matching using the registered pattern, and position checking of an inspection position from positions of the result of pattern matching. In this case, precise position checking for imaging an inspection obje...