这个计算器将确定反应的限制试剂。 Instructions To calculate the limiting reagent, enter an equation of a chemical reaction and press the Start button. The reactants and products, along with their coefficients will appear above. Enter any known value for each reactant. The limiting reagent wil...
Existing SiO2etching mechanism needs modification to explain etching behaviors at pH over 5.Contribution of monofluoride such as F–and HF to SiO2etching was examined.New SiO2etching mechanism and reaction rate in HF solution were proposed.Modified SiO2etching mechanism and kinetics are applicable to ...
【摘要】In order to control the reaction of HF/SiO2 system and realize an accurate fabrication of precise element and glass handiwork, the chemical reaction mechanism and kinetics were discussed. The major factors to affect the etching process were investigated, such as concentration of HF, temperat...
HF酸对玻璃浅层蚀刻模型的研究 秦静 1 ,庞东 2 ,袁騉 1 ,李椿方 1 ,刘通 1 (1.北京市工业技师学院,北京100023;2.中国寰球工程公司,北京100012) 摘要:为控制石英玻璃与HF酸的反应,实现石英玻璃精密元件的化学蚀刻和对石英玻璃工艺品的精确 加工,探讨了化学反应机理和腐蚀的动力学过程。重点探究了影响整个蚀刻...
HF + SIO2 = SIF4 + H2O (2CH3OH) + (3O2) = (2CO2) + (4H2O) Ca(OH)2 + KMnO4 = CaMn2O8 + KOH Ag + Au = Au*Ag HNO3 + CO2 = CHNO5 Na2SO3 + NaClO3 = Na2O4S + NaCl Recently Balanced EquationsBalance BaF2 + H2O = BaO + HF Using the Algebraic Method To balance the equat...
Vibrational Analysis of H2 and D2 Adsorption on Pt/SiO2 calculations and vibrational analysis have been performed within the density functional theory for H adsorption on a silica cluster, (HO)3SiOSi(OH)3. The... Mikaela,Wallin,Henrik,... - 《Journal of Physical Chemistry B》 被引量: 0发...
所以, (蚀刻的浓度 C),A (反应温 reactiontimef. 2122 当 代 化 工 2015年 9月 从 图中可见,1h内6与时间t成较好的线性关 两边取对数整理成 : 系,线性相关系数非常高,R=O.9991。 Ink=InA-Ea/RT (4) 1.2.2 蚀刻深度与浓度关系的研究 以Ink对 1/T作图,即可求得活化能邑。见图 为了将蚀刻深度...
The elementary reaction paths for the reactions of HF and HCl with Si O bonds of the models, Si(OH) 4 and (HO) 3 SiOSi(OH) 3 , are calculated by the Hartree–Fock method. The local transition-state structures are nearly plane quadrangles with neighboring pentacoordinated silicon and tri...
itsreactionrateisthefastestinthreekindsofsilicaglas ses.Inaddition becauseofthehighcontentofhydroXylgroupsintypeIIIsilicaglass itsreactionrateishigherthanthatoftypeIIsilicaglass.Duringthereaction thenucleophilicattackof ~F 2or~F-2onsiliconatomresultsinthebreakingofsi loXanebond while~+ionsadsorbedonthesurface...
For comparison purposes, these materials were subjected to the same reaction conditions as described above for (Hf)PCN-224(Co): epichlorohydrin (0.02 mL, 0.255 mmol), PCN (1 mol%, different amounts according to their molecular weight), TBAB (7.5 mol%, 2.95 mg), CO2 (1 bar) for 24 h...