Considerable research has been conducted on e-beam lithography using evaporated PS in the last decade. Zhang et al.19evaporated PS on an AFM cantilever that was a few micrometers wide and nonplanar. The researchers first evaporated low-molecular-weight PS (1.2 kg/mol) on AFM probes. Subs...
which leads to a decrease inmolecular weight. An excellent review that outlines electronbeam lithographywith a concise description of electron beamenergy dissipationeffects in polymer films has been published.86Very little can be done to increase the energy absorbed when polymer films are irradiated wit...
A review of electron beam lithography techniquesBroers, A N
请问什么是electron-beam lithography?
Electron-Beam Lithography for Patterning Biomolecules at the Micron and Nanometer Scale This review summarizes the use of electron beam (e-beam) lithography to pattern biomolecules on surfaces. The focus is on approaches that employ poly(ethyl... CM Kolodziej,HD Maynard - 《Chemistry of Materials...
This review summarizes the use of electron beam (e-beam) lithography to pattern biomolecules on surfaces. The focus is on approaches that employ poly(ethylene glycol) (PEG) resists. Overview of the different strategies used, including ablation of self-assembled monolayers and cross-linking of PEG...
Electron beam lithography (EBL) 1. Overview and resolution limit. 2. Electron source (thermionic and field emission). 3. Electron optics (electrostatic and magnetic lens). 4. Aberrations (spherical, chromatic, diffraction, astigmation). 5. EBL systems (raster/vector scan, round/shaped beam) 6...
Electron beam lithography (often abbreviated as e-beam lithography or EBL) is the process of transferring a pattern onto the surface of a substrate by first scanning a thin layer of organic film (called resist) on the surface by a tightly focused and precisely controlled electron beam (exposure...
electron beam lithography 是什么？催化里面指什么？有没有什么参考文献，谢谢
The experimental result has confirmed the theoretical analysis: e-beam direct write can produce CGHs with quality superior to conventional photoreduction technique 展开 关键词: Computer generated hologram Electron beam lithography DOI: 10.1016/S0167-9317(02)00570-1 ...