3.4 傅立叶红外光谱测试 (FTIR)分子的振动能量比转动能量大, 当发生振动能级跃迁时, 不可避 免地伴随有转动能级的跃迁, 所以无法测量纯粹的振动光谱, 而只能 得到分子的振动一转动光谱, 这种光谱称为红外吸收光谱。 红外光谱 属于分子光谱, 是确定分子组成和结构的有力工具。 根据未知物红外 光谱中吸收峰的强度、...
3.4傅立叶红外光谱测试(FTIR)分子的振动能量比转动能量大,当发生振动能级跃迁时,不可避免地伴随有转动能级的跃迁,所以无法测量纯粹的振动光谱,而只能得到分子的振动一转动光谱,这种光谱称为红外吸收光谱。红外光谱属于分子光谱,是确定分子组成和结构的有力工具。根据未知物红外光谱中吸收峰的强度、位置和形状,可以确定该...
As the barrier layer of gas permeation and humidity in the inner side of the PET bottle, the influence of the DLC film structure, composition and morphology analyzed by FTIR (Fourier transform inferred), AFM (atomic force microscope) and SEM (scanning electron microscope) on the barrier ...
通过改变溅射功率,沉积气压和和工作气体等实验参数,以使得到的碳膜呈现出不同的表面形貌和性能;采用AFM、AES、FTIR、UV-VIS、椭偏仪等现代化测试手段,通过对薄膜宏观和微观结构的分析,研究了制备工艺对DLC薄膜光学,以及电子化学键结构的影响,采用俄歇电子能谱CKLL的dN(E)/E计算了DLC及DLC:N薄膜的sp2和sp3的组分...
采用电化学沉积方法 ,甲醇有机溶剂作碳源 ,在直流电源作用下在单晶硅表面沉积得到碳薄膜。薄膜不溶于苯、丙酮等有机溶剂 ,具有较高的硬度 (16GPa左右 ) ,用AFM、Raman和FTIR分析手段对该薄膜表面形貌和结构进行表征 ,Raman和FTIR结果表明电化学沉积得到的是含氢的类金刚石碳薄膜。通过研究样品薄膜的XPS和XAES谱图...
薄膜的话您还是用纳米压痕或则原位纳米力学来测吧，大的球磨机可能力太大，一下就磨没了，745831341，...
The films were examined with SEM, TEM, and FTIR spec troscopy. The TEM analysis showed that the films were mainly amorphous and composed of diamondlike and graphitelike domains. The relative amounts of sp3 and sp2 bonding types in SiDLC were determined by IR spectroscopy and the sp3/sp2 ...
FTIR results indicate that the carbon is bonded in the sp 3 form with hydrogen, and this characteristic is more pronounced when smaller holder is used. UV-visible spectra show high visible transmittance (~85%) for films grown in both the holders. The nanoindentation hardness of the films have...
Ahmed, Study of human serum albumin adsorption and conformational change on DLC and silicon doped DLC using XPS and FTIR spectroscopy, J. Biomater. Nanobiotechnol. 4 (2013) 194-203.Ahmed, M.; Byrne, J. A.; McLaughlin, J.; Ahmed, W. Study of human serum albumin adsorption and ...
Prior to etching these films were characterized by different methods, namely Raman spectroscopy, Fourier transform infrared spectroscopy (FTIR), current脳voltage curves and atomic force microscopy (AFM). Etch rates in the range 7.0鈥 25 nm/min were measured for substrates placed at different ...