Systems and methods for determining location of critical dimension (CD) measurement or inspection are disclosed. Real-time selection of locations to take critical dimension measurements based on potential impact of critical dimension variations at the locations can be performed. The design of a ...
The method is adaptable for the measurement of critical dimension (CD). Through the use of dual-tone target patterns designed according to the invention, the method allows for measurement and control of lithographic parameters, such as ... C Ausschnitt - EP 被引量: 16发表: 2010年 Assessment ...
The method is adaptable for the measurement of critical dimension (CD). Through the use of dual-tone target patterns designed according to the invention, the method allows for measurement and control of lithographic parameters, such as dose and defocus. The method is also adaptable for overlay m...
Critical dimension measurement of photoresist pattern after development Measurement of the contact hole diameter / via-hole diameter and the wiring width after etching Products Hitachi Advanced High Resolution CD-SEM Since Hitachi launched its first CD-SEM in 1984, it has been consistently following...
Critical Dimension Measurement by Electron and Optical Beams for the Establishment of Linewidth Standards Electrical critical dimension (ECD) test structures have been adapted for use in a surface micromachining environment and fabricated along side various Mic... 初沢,毅,豊田,幸司 - 《Bulletin of ...
Local and global reduction of critical dimension (CD) asymmetry in etch processing is described. In an example, a method of etching a wafer of to form a plurality of staircase structures with reduced local and global asymmetry involves forming a photoresist layer on a plurality of micron-scale ...
A systematic approach to determine the specifications for process latitude in a 80 nm node device is suggested based on critical dimension (CD) error budget analysis using the Monte Carlo method. Using an aerial image simulation with the Gaussian convolution model, CD error budget analysis is perfo...
aproximity 接近度[translate] aTINTO TINTO[translate] aDo not ullow your wounds to transform you ioto somenone you are not 没有ullow您的创伤变换您您不是的ioto somenone[translate] aSample Measurement Report - Critical Dimension 样品测量报告-重要维度[translate]...
An OCD measurement equipment, including a tunable laser system, and a method of measuring the CD of patterns formed on a substrate. A light source optical system emits light which wavelength changes over time. A projector optical system projects the light emitted from the light source optical ...
Thus, modelling may offer anexplanation of the RMS reduction with reduced dose: Indeed, decrease of dose causes reduction of Critical Dimension(CD) (i.e. diameter) of the hole and therefore reduction of its circumference (i.e. measurement edge length), which inturn causes reduction of RMS ...