The monitoring testkey helps to improve the critical dimension uniformity and electrical characteristics uniformity of elements in a wafer. 展开 收藏 引用 批量引用 报错 分享 文库来源 其他来源 求助全文 MONITORING TESTKEY USED IN SEMICONDUCTOR FABRICATI 优质文献 ...
In fabrication of semiconductors, the minimum line width of the circuit element is called critical dimension (CD). The smaller the circuit element is, the less variation of the CD is allowed. Thus, many techniques for improving the critical dimension uniformity (CDU) are developed, and exposure...
The monitoring testkey helps to improve the critical dimension uniformity and electrical characteristics uniformity of elements in a wafer.Huang, Chin-chunKung, Ji-fuChiu, Wei-poChao, Nick
基于微光斑平行光束的微结构关键尺寸ocd测试系统 Based on micro-micro structure parallel beam spot size ocd key test system该发明公开了一种基于微光斑平行光束的微结构关键尺寸OCD测试系统,包括光源,压缩透镜组,待测周期结构,检测器及数据处理器. The invention discloses a microstructure critical dimension OCD ...
void fractal dimensionnonlinear seepageIn rock mass engineering, stress balance changes often cause the relative slip of fractures along a wall surface, impacting the seepage behavior of fluid in the fractures. Using computer tomography (CT) scanning, spatial models of fractures with dislocations ...
After calculation, the dimension parameters obtained are shown in Table 2. Table 2. The results of the dimension parameters of the hammering device. 2.3.2. The Structure of the Grinding Device The rolling and rubbing device is mainly composed of a hand wheel, gear, shelling arc plate, screw...