AZ P4620 Photoresist数据包说明书
AZ P4620 Photoresist
光刻胶SpinCuneSpinSpeed(rpm)-*-5206E-O-5214E-521SE-90sec.(DHP):g-linestepperand-orContactAligner:AZ300NUFDeveloper23C60300sec.:Dl-water:120,C60sec.:AZRemoverand-orOnplasma-ashingAZP4000AZP4000系列光刻胶AZP4000AZP4000系列光刻胶产品型号(PRODUCTRANGE)ProductNameAZP4210AZP4330AZP4400AZP4620AZP...
350-450nm sensitive Develop: Spray or immersion Developer type: Inorganic (IN) * Use higher soft bake temp. for best adhesion to metals. Ramped temperature may be required for thicker films.OPTICAL CONSTANTS* 96µm gold bump plated in AZ P4620 Cyanide electro -plating solution
350-450nm sensitive Develop: Spray or immersion Developer type: Inorganic (IN) * Use higher soft bake temp. for best adhesion to metals. Ramped temperature may be required for thicker films.OPTICAL CONSTANTS* 96µm gold bump plated in AZ P4620 Cyanide electro -plating solution