300MIFDeveloper Description AZ ® 300MIFpositivephotoresistdevel- operisahighpurityformulationofthe industrystandard2.38weight%tetra- methylammoniumhydroxide(TMAH) and0.261Nmetal-ion-freedeveloper. Itisformulatedtomeetthemicrolitho- graphicandprocessrequirementsfor ...
i-line steppers. Recommended developers are inorga-nic based upon potassium hydroxide. The preferred developer is AZ®400K Developer 1:4, a buffered developer designed to maximize bath life and process stability. For integrated circuit applications, TMAH developers such as AZ®300 MIF developer ...
AZ 10XT Series 厚度正弦光敏胶数据手册说明书 Technical datasheet APPLICATIONS Thick positive tone photoresists for plating applications featuring improved sidewall profiles, aspect ratios, and photospeed vs. typical thick DNQ type materials.• MIF and IN developer compatible • No post exposure bake...
None • Expose: 365nm sensitive • Post Expose Bake: 90ºC/60s • Develop: Puddle, spray or immersion • Developer Type: MIF * PEB is required for proper imaging SPIN CURVES (150MM SILICON) AZ ® 12XT -20PL Series Chemically Amplified Positive Tone Photoresists