Disclosed herein is a method for applying plasma-resistant coatings for use in semiconductor processing apparatus. The coatings are applied over a substrate which typically comprises an aluminum alloy of the 2000 series or the 5000 through 7000 series. The coating typically comprises an oxide or a ...
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20020142611Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof2002-10-03O'Donnell et al.438/710 20020110698Thermal barrier coatings and electron-beam, physical vapor deposition for making same2002-08-15Singh428/472 ...
Suspension plasma spray coatingAnodizingUnderstanding the dielectric breakdown voltage of coatings inside plasma equipment is important for improving the reliability of semiconductor processes. Measurements of breakdown voltage can vary owing to many factors, but the measurement itself has not yet been ...
METHOD OF COATING SEMICONDUCTOR PROCESSOR WITH YTTRIUM-CONTAINING PROTECTIVE COATINGPROBLEM TO BE SOLVED: To provide a coating which shows erosion resistance against halogen-containing plasma and reduces possibility of plasma arc discharge on a surface of the coating.JENNIFER Y SUN...
Methods of applying specialty ceramic materials to semiconductor processing apparatus, where the specialty ceramic materials are resistant to halogen-comprising plasmas. The specialty ceramic materials contain at least one yttrium oxide-comprising solid solution. Some embodiments of the specialty ceramic ...
Methods of applying specialty ceramic materials to semiconductor processing apparatus, where the specialty ceramic materials are resistant to halogen-comprising plasmas. The specialty ceramic materials contain at least one yttrium oxide-comprising solid solution. Some embodiments of the specialty ceramic ...
Methods of applying specialty ceramic materials to semiconductor processing apparatus, where the specialty ceramic materials are resistant to halogen-comprising plasmas. The specialty ceramic materials contain at least one yttrium oxide-comprising solid solution. Some embodiments of the specialty ceramic ...
Semiconductor processing apparatus comprising a coating formed from a solid solution of yttrium oxide and zirconium oxideA ceramic article useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The ceramic article is formed from a combination of yttrium oxide and...