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Optimization of Tungsten Dual Poly-Metal Gates in Memory Devices with Ti/WN/WSiN Barrier MetalW-Dual Poly Metal GateWSiNDiffusion Barrier MetalDue to the demand of high-speed/high-density and low power application of memory devices, tungsten dual poly gate (W-DPG; W/barrier metals/n+ and ...
We investigated the electrical characteristics of W/WN_x/poly Si_(1-x)Ge_x and the MOSCAP structures with W/WN_x/poly Si_(1-x)Ge_x gates stack using 4-point probe, XRD, and TEM as well as C-V and I-V. The sheet resistance of W/WN_x/poly Si_(1-x)Ge_x films was ...