Magnetron sputtering works by placing a magnetic field around the source material that will be used for deposition of layers onto the target. The chamber is then filled with an inert gas, such as argon. As the source material is electrically charged with either AC or DC current, ejected elect...
on natively oxidized Si 100 substrates by dc magnetron sputtering from a binary Fe50Pt50 alloy target at an argon pressure of 2.0 Pa at room temperature Fe51Pt49薄膜以 50毫微米的厚度在当地被氧化的Si 100 基体被放置了由飞溅从一个二进制Fe50Pt50合金目标的dc磁控管以2.0 Pa氩压力在室温[translate...
Type:Magnetron Sputtering; Coating:Vacuum Coating; Substrate:Steel; Condition:New; Product Name:Magnertron Sputter Coater; Coating Method:Magnetron Sputtering; DC Power:500W; RF Power:300W; Chamber Size:325*500mm; Substrate Size:150mm; Substrate Heating:Max. 500c; ...
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The key step is to change the perspective from fabricating devices to developing, maintaining and advancing the fabrication process. Tools and methods are introduced and discussed, using the development of magnetoelectric MEMS sensors within a collaborative research project as an illustrative example. ...
The key step is to change the perspective from fabricating devices to developing, maintaining and advancing the fabrication process. Tools and methods are introduced and discussed, using the development of magnetoelectric MEMS sensors within a collaborative research project as an illustrative example. ...
The key step is to change the perspective from fabricating devices to developing, maintaining and advancing the fabrication process. Tools and methods are introduced and discussed, using the development of magnetoelectric MEMS sensors within a collaborative research project as an illustrative example. ...
The first stage involved the deposition of multilayer precursors on either thin soda lime glass (SLG) or Mo-coated SLG substrates, using DC-magnetron sputtering of CuGa alloy with 25wt.% Ga and elemental In targets and the thermal evaporation of Se. Fabrication of a Cu(InGa)[Se.sub.2] th...
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