The present invention relates to an aqueous etching solution containing ammonium fluoride, hydrofluoric acid and one or more primary aliphatic amines having a chain length of 6 to 18 carbon atoms, characterised in that it contains ammonium fluoride in amounts of 0.1 to 17.5% by weight, ...
And etching process could be categorized into Dry Etching (DE) and Wet Etc 2、hing (WET) on the basis of technics and equipments.作为蚀刻工序的一种实现方式,WET工序详细来讲可以包括清洗,湿蚀刻和脱膜。As one of etching solution, Wet Etching includes washing, wet etching and stripping.1. 清洗...
Metallic contamination on wafers, dependent on a kind of solutions and the concentration in a solution, degrades TDDB characteristics and recombination lifetime. Although the lifetime degradation is a serious problem for ULSI, the damage by etching and by ion implantation causes the lifetime ...
Wet Etching 来自 Springer 喜欢 0 阅读量: 14 作者:AP Nayak,MS Islam,VJ Logeeswaran 摘要: Synonyms Chemical etching ; Liquid etching Definition Wet etching is a material removal process that uses liquid chemicals or etchants to remove materials from a wafer. The specific patters are defined by ...
Wet Etching Method and Etching Solution 专利名称：Wet Etching Method and Etching Solution 发明人：Akifumi YAO,Kunihiro YAMAUCHI,Masaki FUJIWARA,Tatsuo MIYAZAKI 申请号：US15573302 申请日：20160622 公开号：US20180138053A1 公开日：20180517 专利内容由知识产权出版社提供 摘要：Disclosed is a wet etching method...
1、WETWET工艺介绍工艺介绍 LNLN234Wet Cleaning (Pre-treatment)Wet Cleaning (Post-treatment)Resist RemovalDiffusionCVDPVDLithographyEtchingDopingWafer InWafer OutIC Processing5Wet Process1.FEOL post-ash clean35%- typical SPM.- trend is to integrate resist striping and cleaning.2.Pre-diffusion clean30...
System and Method for Wet Chemical Etching in Semiconductor Processing A wet etch system comprises an etching bath comprising an etching solution in a process tank inside an overflow tank flowing over an open top into the overflow tank. The etching bath has a top cover, a gas inlet, and a ...
Through Glass Vias by Wet-etching Process in 49% HF Solution Using an AZ4620 Enhanced Cr/Au Mask Through glass vias on a high-quality borosilicate glass wafer (i.e., BOROFLOAT 33) ofG Ding,B Ma,Y Yan,... - IEEE International Conference on Nano/micro Engineered & Molecular Systems 被引...
A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40%
In the art of wet-cleaning a substrate by etching with a cleaning solution (131) prepared by dissolving hydrofluoric acid as an active component in water, using the process of measuring the concentration of a predetermined component regu... ...