The invention provides a synchronization control method of a wafer stage and a reticle stage. The wafer stage and the reticle stage are installed on a framework of an integral machine of a photoetching machine. The synchronization control method comprises the steps of setting a desired location ...
Structure and principle of scanner In Fig. 1, the wafer and the reticle is fixed relative to the projection lens. In practice, the wafer and the reticle are placed onto positioning tables, i.e. the wafer stage and reticle stage, which are actively controlled. A narrow beam, which has bee...
7. A lithography apparatus comprising: a reticle stage that one of transmits or reflects an image; a wafer stage, said reticle stage oriented substantially orthogonal to said wafer stage; a catadioptric exposure optics element, oriented between said reticle stage and said wafer stage, that causes...
Methods and apparatus for enabling a stage apparatus to scan an object within a vacuum environment associated with an extreme ultraviolet lithography system are disclosed. According to one aspect of the present invention, a stage apparatus that is suitable for operation in a vacuum environment includes...
WuaSchoolXinglinSchoolChenSchoolAsian Network for Scientific InformationInformation Technology JournalSynchronization control for reticle stage and wafer stage based on iterative learning control. Wu, Zhipeng,Chen, Xinglin. Information Technology Journal . 2012...
Purpose: a kind of focus monitoring system of wafer exposure tool is arranged to monitor a pinpointed focus by using wafer stage label and a graticule reference mark. Construction: a light source is used to irradiate the light of predetermined wavelength. One graticule (22) is installed in a...
Quality of exposures in step and scan lithographic equipment highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a high precision synchronization control method for scanning movement of reticle and wafer stage based on ...
Quality of exposures in step and scan lithographic equipment highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a high precision synchronization control method for scanning movement of reticle and wafer stage based on ...
The synchronous error correction system has the advantages that the trace planning module is used for planning and digitalizing accelerations, speeds and position traces of the wafer stage and the reticle stage in a scanning and exposing process, can perform corresponding trace planning according to ...
Catadioptric lithography system and method with reticle stage orthogonal to wafer stageHarry SewellJorge IvaldiJohn Shamaly