C. Schietinger, "Wafer emissivity in RTP," in Advances in Rapid Thermal and Integrated Processing, F. Roozeboom, Ed. Dordrecht, The Netherlands: Kluwer, 1996, ch. 4, pp. 125-142.Schietinger, C., “Wafer Emissivity in RTP,” F. Roozeboom (ed.), Advances in Rapid Thermal and ...
Advanced In-situ Emissivity Independent Non-contact Temperature Monitor The NTM Delta is the only high accuracy and repeatability pyrometer which incorporates both real-time same-point emissivity and temperature measurement. Its design is based on CI Semi’s well-known NTM500, with thousands of instal...
A Monte Carlo model for predicting the effective emissivity of the silicon wafer in rapid thermal processing furnaces Advances in microelectronics led to the development of rapid thermal processing (RTP). Accurate in situ temperature measurement and control are crucial for... YH Zhou,YJ Shen,ZM Zha...
RTP temperature measurement using conventional pyrometric technique has serious limitations such as uncertainty of emissivity, lamp interference, and window/chamber heating effect. In this paper, we propose to compensate for these effect... S Belikov,J Kamali,YJ Lee,... - Cambridge University Press...
Woo Sik Yoo et al., "Highly Reliable, Backside Emissivity Independent Cobalt Silicide Process Using a Susceptor-Based Low Pressure Rapid Thermal Processing System", Jpn.J.Appl.Phys., vol. 37 (1998) pp. L1221-L1223, Part 2, No. 10B, Oct. 15, 1998. ...
We report on the results of changing the wafer emissivity and the effect of low emissivity films on the lightpipe radiation thermometer (LPRT) measurements in the NIST RTP Test Bed. A NIST thin-film thermocouple (TFTC) calibration wafer was used to calibrate the LPRTs in situ. The ...
The 201st Meeting of the Electrochemical Society: Meeting Abstracts Volume 2002-1K. G. Kreider, D. P. DeWitt, D. H. Chen, W. A. Kimes, C. W. Meyer, and B. K. Tsai, Wafer Emissivity Effects on Light Pipe Radiometry in RTP Tools, in Proc. 201th Mtg. Electroch. Soc., Adv. ...
A novel wafer temperature and emissivity measurement technique for rapid thermal processing (RTP) is presented. The 'Ripple Technique' takes advantage of heating lamp AC ripple as the signature of the reflected component of the radiation... C Schietinger,B Adams,C Yarling - 《Mrs Proceedings》 ...
Effects of wafer emissivity on rapid thermal processing temperature measurement Lightpipe radiation thermometers (LPRTs) are widely used to measure wafer temperatures in rapid thermal processing (RTP) tools. To use blackbody‐calibrate... DH Chen,DP Dewitt,BK Tsai,... - IEEE 被引量: 18发表: 20...
Mrs ProceedingsS. Belikov, D. Hur, B. Friedland, N.M. Ravindra, "Estimation of Emissivity of a Wafer in an RTP Chamber by a Dynamic Observer", in Proceedings of Rapid Thermal and Integrated Processes V, Material Research Society Conference, Pittsburgh, PA, 1996....