OpticalLithography System.(ASML's Twinscan XT:1900i)(Brief article)
ASML TWINSCAN XT1900Gi Immersion Scanner used Manufacturer:ASML 300mm Bree, Ireland Trusted Seller ASML TWINSCAN XT1950Hi used Manufacturer:ASML Configured for 300mm wafer size EQUIPMENT DETAILS: Tool Status: In production. Configuration. Description ASML — SCANNER — XT: 1950Hi — 193nm IMMERSION...
ASML Holding NV近日在SEMICON West上发布其最新的沉浸式光刻设备 Twinscan XT 1950i。尽管该设备与之前的同类产品同样采用1.35孔径(NA),然而该系统的分辨率从40nm改善至38nm,这能使芯片在面积上收益10%。此外,该系统在覆盖、分辨率、关键尺寸均一性和吞吐量等方面均
XT: 1700i and XT:1900i scanners ID printing results from a line-space test reticle, parametric sensitivity ... Y He,P Engblom,J Zhou,... - Optical Microlithography XXII 被引量: 0发表: 2009年 Enabling 35nm double patterning contact imaging using a novel CD shrink process - art. no. ...
1900iTWINSCAN.Double Patterning (DP), Spacers and other advanced Litho technologies require an enormous amount of CD and tooldata collection and development time for Optical Proximity Correction (OPC) modeling. Unfortunately this processcould be started typically only when the Litho and Etch process ...