The TWINSCAN NXT:1470 is built on the latest version of our NXT high-throughput, high-precision system architecture, featuring improved wafer stages and wafer handlers. Combined with the enhanced optics and improved lens and reticle heating control, it enables on-product overlay below 4.5 nm – w...
The first NXT system, the TWINSCAN NXT:1950i, was launched in 2008 and delivered a 30% increase in productivity to over 200 wafers per hour, while also improving overlay to 2.5 nanometers (nm). Today’sleading NXT immersion systemscan process 295 wafers per hour with overlay down to 1 nm...