The TWINSCAN NXT:1470 is built on the latest version of our NXT high-throughput, high-precision system architecture, featuring improved wafer stages and wafer handlers. Combined with the enhanced optics and improved lens and reticle heating control, it enables on-product overlay below 4.5 nm – w...
对于这些层,速度更为关键,而最快的光刻系统采用了TWINSCAN NXT平台。 随着浸润式NXT系统越来越多地用于次关键层,ASML决定将NXT平台扩展出用于次关键层的“干式”技术。于是,TWINSCAN NXT:1470——第一个在产品上实现套刻精度优于4.5纳米的干式系统,成为了第一台能够每小时处理超过300片晶圆的光刻机。 第一台TWINSC...
In mid-2020, at the height of the COVID-19 pandemic, ASML shipped its first-ever dry NXT system. It was the first lithography system of any kind capable of processing more than 300 wafers per hour. But it’s the history of TWINSCAN – the platform on which these systems were built –...