Damage-free tribochemical polishing of diamond at room- temperature - a finishing technology. Precision Eng-J Am Soc Precision Eng 1992;14(1):20-7.J Haisma,et al.Damage-free tribochemical polishing of diamond at room temperature: A polishing technology. Precision Engineering . 1992...
Tribochemical Mechanism of the Glass Polishing Process by the Akvapol ToolRogov, V VV. V. Rogov, "Tribochemical mechanism of the glass polishing process by the `Akvapol' tool," Sov. J. Opt. Technol. 58, 366 - 369 ͑1991͒.
Chemical mechanical polishingReaxFF molecular dynamics simulationIn this work, the atomic mechanism of tribochemical wear of silicon at the Si/SiO2interface in aqueous environment was investigated using ReaxFF molecular dynamics (MD) simulations. Two types of Si atom removal pathways were detected in ...
Tribochemistry of silicon nitride; Tribochemical reactions of silicon nitride; Applications of tribochemical polishing.MuratovViktorA.FischerTraugottE.EBSCO_AspAnnual Review of Materials ScienceMuratov V A; Fischer T E.Tribochemical polishing.Annu Rev Mater Sci.2000.27-51...
Reports on an article published in the Journal of Electrochemical Society, volume 145, 1998 which indicated that researchers at the Stevens Institute of Technology in New Jersey had devised a chemical mechanical polishing technique known as tribochemical polishing. Information on chemical mechanical ...
Tribochemical polishing (TCP) is a new polishing technology in which the material removal occurs by a chemical reaction that is stimulated by friction. It does not rely on abrasive particles. Like chemomechanical polishing, it produces defect-free, ultra smooth surfaces and stress-free material ...
Examples of materials for the tribochemical polishing process includes ceramics such as silicon, silicon nitride, silicon carbide, silicon oxide, titanium carbide and aluminum nitride and metals such as tungsten. Both ceramic and metal surfaces can be polished, as in a damascene structure of an ...
Examples of materials for the tribochemical polishing process includes ceramics such as silicon, silicon nitride, silicon carbide, silicon oxide, titanium carbide and aluminum nitride and metals such as tungsten. Both ceramic and metal surfaces can be polished, as in a damascene structure of an ...
Prediction of the Interface Temperature Rise in Tribochemical Polishing of CVD Diamond[J]. Zewei YUAN,Yan HE,Zhuji JIN,Peng ZHENG,Qiang LI.Chinese Journal of Mechanical Engineering. 2017(02)Yuan Z, Yan H E, Jin Z, et al. Prediction of theInterface Temperature Rise in Tribochemical Polishing...
Quanta 200 scanning electron microscope (SEM) and Oxford INCA 250 energy-dispersive spectrometer (EDS) and x-ray diffraction (XRD) diffractometer were used to observe the surface, analyze the elements, and determine the composition of silicon carbide workpiece after tribochemical mechanical polishing. ...