The film chemical composition can be tuned to a more inorganic structure by admixture of O2 leading to an increase in SiO4 units at high oxygen flow rates.doi:10.1002/ppap.201200166Xiaolong DengDepartment of Applied PhysicsAnton Yu Nikiforov...
This paper reports that the SiOx barrier films are deposited on polyethylene terephthalate substrate by plasma-enhanced chemical vapour deposition (PECVD) for the application of transparent barrier packaging. The variations of O2/ Tetramethyldisiloxane (TMDSO) ratio and input power in radio frequency (...
This paper reports that the SiOx barrier films are deposited on polyethylene terephthalate substrate by plasma-enhanced chemical vapour deposition (PECVD) for the application of transparent barrier packaging. The variations of O2/ Tetramethyldisiloxane (TMDSO) ratio and input power in radio frequency (...