MicroChem / Nippon Kayaku - 光刻胶2024-07-24 光刻胶photoresistAZ MIR700系列2024-07-24 Merck集团光刻胶2024-07-24 Dupont集团光刻胶2024-07-24 厦门az5214光刻胶购买-SU/AZ系列光刻胶2024-05-13 德国Allresist 特殊工艺用光刻胶2024-05-11相关...
罗门哈斯光阻Megaposit_SPR220_Serie
2. As a first step, nanopatterns were created in a photoresist, ZEP520A (Nippon Zeon, Japan) coated on an 8 inch silicon wafer. The nanopatterning step typically takes around 9 hours to pattern a 45 mm2 area. After that, the nanopatterned area was sputtered with Ni (CS-200S, ULVAC,...