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such as O2. In some embodiments, etching is performed by exposing the substrate to a plasma formed in a process gas comprising HBr, O2, and N2. This type of etch can remove SnO material selectively relative to materials, such as silicon, and silicon oxide. It is noted that the ...
The self-cleaning process was evaluated by analyzing the discoloration of coffee and palm oil stains by ultraviolet/visible diffuse reflection spectroscopy and mineralization via C O2 evolution, recorded using an infrared sensor. The results indicate that grafting T iO2 onto nylon, a synthetic fiber,...