CAB-O-SIL TS-720 白炭黑 卡博特疏水型气相法二氧化硅 白炭黑 卡博特品牌 深圳龙帝化工有限公司 4年 查看详情 ￥78.00/千克 上海 Evonik赢创 ACEMATT OK 607 消光粉 沉淀法二氧化硅 粉末状 广州市贤人汇国际贸易有限公司 6年 查看详情 ￥3.90/千克 山东济南 首越气相法白炭黑补强填充剂超细颗粒增稠剂沉淀法...
17201 Tosoh ODS-80TS 150*4.6 5um 色谱柱 8541 Tosoh TSKgel G3000SWXL 7.8*300mm (5)色谱柱 21966 Tosoh CM-STAT, 7um, 4.6x100mm 8543 Tosoh TSKgel guard column SWXL 6.0*40 保护柱 14947 Tosoh Butyl-NPR 4.6*35 色谱柱 HS12S02-1003WT YMC Hydrosphere C18 2um 3x100mm 色谱柱 TAR08S05-...
TS100消光粉是Tosoh Silica东曹硅化工株式会社研发的一款消光粉,型号为Nipsil E-1011,东曹消光粉E-1011是一种粒径特别细的消光粉,平均粒径仅为1.5μm,满足薄涂体系的苛刻要求。手感细腻,符合客户对于漆膜表面手感越来越高的要求 消光粉与哑光剂的区别有哪些?消光粉生产厂家2023-04-18 消光粉与哑光剂都是工业生产...
BRINKMANN泵TYPE:TS 22/110-X+191 No.-37979001 REXROTHHED8OP-2X/200K14AS DI-SORICWRB250KB-1.2-1.0 DI-SORICUS18KR1003PSAK-TSSL *PARKERD1DLB4NN77 HUBNER-0239Nr.1354500 AG14DN2048TTL DEMAG电机KBA100B41420U/min3,00kW-40%ED230/400V,50Hz ...
MDL NumberMFCD00011232 EC No.262-373-8 IUPAC NameDioxosilane Beilstein/Reaxys No.N/A SMILESO=[Si]=O InchI IdentifierInChI=1S/O2Si/c1-3-2 InchI KeyVYPSYNLAJGMNEJ-UHFFFAOYSA-N Packaging Specifications Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and stee...
A rapid chromatographic method for the simultaneous determination of uric acid (UA) and creatinine (Cr) in human urine is described, using a non-bonded 1.7 mu m thin-shell (TS1.7-100 nm) silica particle prepared by the seeded-growth approach. The new shell particle was characterised by ...
LA4380-1550Customer Inspired!Lente plano-convexa UVFS, Ø1", revestimento em V de 1550 nm, f = 100 mm R$ 1.456,40 2-3 Weeks LA4236-1550Customer Inspired!Lente plano-convexa UVFS, Ø1", revestimento em V de 1550 nm, f = 125 mm ...
Cab-O-Sil Clarus 3160, EH-5, EH-5F, EL-90, H-5, −300, HP-60, HS-5, L-90, LM-150, −1500, M-5, −5DP, −5F, − 5P, −7D, MS-55, −75D, PTG, S-17D, TS610 Duramold 2150–hydrophilic (untreated) grades of fumed silica differing in average primary particle...
Introduction of PDI and TMODS in molar ratio of 1:0.01 (PT-1) and 1:1 (PT-2) led to changes in aggregation of the PDI molecules on the tshuarfnacthea(tFfiogr. 4PcT)-. 1ThneanAo0p-0a/Art0i-c1lerast(i0o.7fr5o)m. the absorption spectra of the PT-2 was found to be ...
Then, Co-O-Si bonds were gradually formed at high temperature (TS, Fig. 4h). It is obviously that the rate-determining step in the dehydroxylation over Co/SiO2 was from IM1 to TS, with the energy barrier of 0.634 eV (Fig. 4h), which was lower than that of SiO2. After that, ...