In the 1980s, it was already demonstrated thatn-type polysilicon and semi-insulating polycrystalline silicon emitters form carrier-selective emitters which enabledopen-circuit voltages(Voc) of up to 720mV. Albeit promising, to date a polysilicon emitter solar cell having a highfill factor(FF) has...
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(001) leads to the formation of monohydrides H–Si andhydroxylsOH–Si groups. However, uncapped Si atoms always remain on this passivated surfaces and form iDBs. Indeed, unlike H–Si(001) surfaces where DB patterns were generated artificially using aSTMtip, on the water-passivated Si(001) ...
They concluded that Ti and Si may form strong TiC and SiC bonding to enhance film adherence [4]. Polini et al. studied the use of CrN/Cr and CrN interlayers in HFCVD diamond films onto a WC-Co substrate. It was concluded that the unpeened single-layer CrN and MC pretreatment for the...
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The deposition/removal cyclic processes may be repeated until the trench is filled with amorphous silicon layers. The amorphous silicon layers form a seamless amorphous silicon gap fill in the trench since the amorphous silicon layers are formed from bottom up....
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