A method of generating mask data, for a set of masks used to transfer a pattern for delineating a circuit pattern of a semiconductor integrated circuit, includes preparing design data having a design pattern corresponding to the pattern to be transferred on a semiconductor substrate; generating ...
1. A set of masks for the projection of structure patterns in a photosensitive layer on a semiconductor wafer in a projection system in each case, the structure patterns being arranged on the masks of the set and coordinated with one another, into the same comprising: a first mask having at...
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A set of at least two masks for the projection of structure patterns coordinated with one another by a projection system into the same photosensitive layer of a semiconductor wafer, in which the set of at least two masks includes a primary mask having an opaque structure element, which is for...
union (max) - The maximum value between the two masks. intersection (min) - The minimum, value between the two masks. difference - The pixels that are white in the first mask but black in the second. multiply - The result of multiplying the two masks together. Same as intersection for ...
intersection (min)- The minimum, value between the two masks. difference- The pixels that are white in the first mask but black in the second. multiply- The result of multiplying the two masks together. Same as intersection for any thresholded masks. ...
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Please note that the effectiveness of the mask depends on a proper fit and how the mask is worn Please store in a dry and ventilated place Mask is disposable, not washable Please refer to CDC guidelines for best practices on how to wear, remove, and dispose a mask...
2.Can I branding masks with my logo and customized packages? A:Yes. Freely let us know your requirement. We accept OEM, ODM order. 3.How can I place the order? A:You can contact us by email about your order details ,or place orde...