型号:SI500-RIE RIE plasma etcher Smart solution for He backside cooled etching Capacitive coupled plasma source, upgradable to ICP plasma source PTSA 200 型号:SI500-300 ICP plasma etcher With vacuum loadlock For 300 mm wafers 关键词:SENTECHSI500电感耦合等离子体ICP干法刻蚀系统离子刻蚀与沉积系统...
chamber and vacuum loadlockSubstrate temperature from -150 °C to 400 °C型号:SI500-300ICP plasma etcherWith vacuum loadlockFor 300 mm wafers型号:SI500-RIERIE plasma etcherSmart solution for He backside cooled etchingCapacitive coupled plasma source,upgradable to ICP plasma source PTSA 200...
型号:SI500-RIE RIE plasma etcher Smart solution for He backside cooled etching Capacitive coupled plasma source, upgradable to ICP plasma source PTSA 200 型号:SI500-300 ICP plasma etcher With vacuum loadlock For 300 mm wafers 厂商推荐产品 ...
型号:SI500-RIE RIE plasma etcher Smart solution for He backside cooled etching Capacitive coupled plasma source, upgradable to ICP plasma source PTSA 200 型号:SI500-300 ICP plasma etcher With vacuum loadlock For 300 mm wafers 热门标签:SENTECHSI500电感耦合等离子体ICP干法刻蚀系统离子刻蚀与沉积系统...