Methods and apparatuses for forming symmetrical spacers for self-aligned multiple patterning processes are described herein. Methods include depositing gapfill material by atomic layer deposition over a patterned substrate including core material and a target layer, planarizing substrate, and etching the ...
Herein, we describe a facile micropatterning method for producing chemically well-defined surface architectures by combining microcontact (碌CP) and microfluidic vacuum-assisted degas-driven flow guided patterning (DFGP) with a poly(dimethylsiloxane) (PDMS) stamp. To demonstrate our concept, we ...
Embodiments of the present invention pertain to methods of forming features on a substrate using a self-aligned double patterning (SADP) process. A conformal layer of non-sacrificial material is formed over features of sacrificial structural material patterned near the optical resolution of a ...
Embodiments of the present invention pertain to methods of forming features on a substrate using a self-aligned double patterning (SADP) process. A conformal layer of non-sacrificial material is formed over features of sacrificial structural material patterned near the optical resolution of a ...
J., "Self-aligned double patterning (SADP) compliant design flow," Proc. SPIE 8327, 832706 (2012).Ma, Y., Sweis, J., Yoshida, H., Wang, Y., Kye, J., and Levinson, H. J, "Self-aligned double patterning (SADP) compliant design flow," in Proc. of SPIE, 8327, 832706-832706-...
Soft lithography-based patterning techniques have been developed to investigate biological and chemical phenomena. Until now, micropatterning with various materials required multiple procedural steps such as repeating layer-by-layer patterning, aligning of stamps, and incubating printed inks. Herein, we ...
In order to evaluate process performances of directed self-assembly (DSA) lithography for semiconductor device manufacturing, we developed a novel simple sub-15nm line-and-space (L/S) patterning process using polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) lamellar block copolymer (BCP). ...
doi:US7972959 B2Bencherki MebarkiLi Yan MiaoKenlin C. HuangUSB. Mebarki, L. Y. Miao, and K. C. Huang, “Self aligned double patterning flow with non-sacrificial features,” U.S. Patent 7,972,959 (2011).
LI YAN MIAOBENCHERKI MEBARKIKENLIN C. HUANGB. Mebarki, L. Y. Miao, and K. C. Huang, “Self aligned double patterning flow with non-sacrificial features,” U.S. Patent 7,972,959 (2011).
J.-R. Gao et al., "Self-aligned double patterning compliant routing with in-design physical verification flow," Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, p. 868408, 2012.Jhih-Rong Gao, Harshdeep Jawandha, Prasad Atkarc, Atul Walimbe, Bikram Baidya,...