Felts, J. R., Onses, M. S., Rogers, J. A. & King, W. P. Nanometer scale alignment of block-copolymer domains by means of a scanning probe tip.Adv. Mater.26, 2999–3002 (2014). CASGoogle Scholar Carroll, K. M. et al. Parallelization of thermochemical nanolithography.Nanoscale6, ...
9. A lithography system, comprising: an AFM head having a probe adapted to be heated; and a resist medium comprising a substrate and a polymer resist layer within which features are produced by mechanical action of the probe, wherein the polymer resist contains thermally reversible crosslinkag...
Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in application fields ranging from quantum technologies...
In situ AFM imaging and closed-loop lithography: In addition to patterning, the t-SPL tip can image the surface topography before, after and during patterning, similarly to an AFM tip (with the tip heater turned off). Hence, the quality of the written pattern can be imaged in situ, which...
摘要: Scanning helium ion beam lithography is presented as a promising pattern definition technique for dense sub-10-nm structures. The powerful performance in terms of high resolution, high sensitivity, and a low proximity effect is demonstrated in a hydrogen silsesquioxane resist....