关于Chamber内电位分布,如上图A所示。Plasma是部分离子化的导电气体,整体呈电中性,因此宏观看,在plasma内是等电位,离子在plasma中朝着散乱的方向运动。Plasma所持有的电位称为电浆电位(Plasma Potential)Vp。虽然Vp因为各种条件而变化,但大约在10~50V程度。另一方面,在离子鞘内,由于朝向电极形成-Vdc的电位斜率,来到plas...
Transmission line RF applicator apparatus and method for coupling RF power to the plasma in the plasma chamber . The apparatus includes an inner conductor , one or two of the outer conductor . Main part of each of the one or two outer conductor includes a plurality of openings extending ...
VHF 区间(30~300MHz)的 RF CCP source 可以在低压获得 high plasma density。但是随着RF频率上升,由于standing wave effect 和 skin effect的影响,plasma分布变的不均匀。 Standing waver effect 驻波效应:由于入射波和反射波重叠,出现波节和波腹。 chamber center 作为起点,RF voltage 和Current 高,所以plasma 密度...
Plasma chamber with fixed RF matching搜索 U.S. Patent5,643,364RF GENERATOR13.56MHz OUTPUTPOWER STAGE@F?::? 12a 12 b1 Bo 1BbFWD. REFL.PWR. PWR.20GENERATORy02b35OKHz OUTPUTPOWER STAGEIER R OR 12+?I - DESIRED-¿- POWERFWR. PWR. REFL.1Bo 1Bb(-12c !DUALD!RECT!ONALCOUPLERCONTROLCR...
RF plasma generator Apex RF The versatile Apex® family of RF generators and power-delivery systems showcases a compact, modular design suitable for chamber mounting. Utilizing sophisticated RF-conversion technology, ... Compare this product See the other productsADVANCED ENERGY RF plasma generat...
但是实际过程中,plasma是一种高速电子,以及电子的窜动,都会或多或少影响负载的大小及相位。所以我们chamber的环境也很重要。 Gongchuang PV Confidential 21Load:使用电容来匹配,作用:匹配电阻tune:使用电容来匹配,匹配,作用:匹配相位 Gongchuang PV Confidential 22RF在机台上的应用与监控Cmatch=匹配电容Ctune=匹配...
但是实际过程中,plasma是一种高速电子,以及电子的窜动,都会或多或少影响负载的大小及相位。所以我们chamber的环境也很重要。 Gongchuang PV Confidential 22Load:使用电容来匹配,作用:匹配电阻tune:使用电容来匹配,匹配,作用:匹配相位 Gongchuang PV Confidential 23RF在机台上的应用与监控Cmatch=匹配电容Ctune=匹配...
At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a...
circuit to be used in a high RF frequency range dispensing with an expensive variable RF matching circuit by a method wherein an RF power cathode is arranged apart from a coupling device such as an electrode or an antenna which feeds an RF power to a plasma chamber by a specific distance...
RF PLASMA ETCH REACTOR WITH INTERNAL INDUCTIVE COIL ANTENNA AND ELECTRICALLY CONDUCTIVE CHAMBER WALLSThe present invention provides an inductive antenna secured within a processing chamber. The antenna may be constructed so that it can be attached to an electrically conductive chamber wall and so that ...