When a pattern defect exists in the reticle, the defect is transferred onto the wafer. It is therefore necessary to perform a reticle defect inspection. As reticle defect inspection methods, there are known a Die-to-Die inspection method and a Die-to-Database inspection method. The Die-to-...
An optical device including a spatial filter disposed at a location coincident with or in close proximity to a position optically conjugate with a pupil of a projection optical system for projecting a pattern of a mask onto a wafer. The spatial filter is adapted to intercept a light beam specu...
In this case, the individual micromirrors of the micromirror array which are not in the deflection position but rather in the reflection position are imaged onto the light-sensitive substrate with an imaging ratio of 1:100 of the projection objective. Given a typical maximum diameter of the ...
Referring to FIG. 12, it can be seen that G peak, D peak, and 2D peak appear in a Raman spectrum. A D/G intensity ratio may be about 0.5 or more. The D/G intensity ratio may be about 1 or more. The D/G intensity ratio may be about 2 or less. A 2D/G intensity ratio may...