silicon/ pulsed laser ablationsilicon depositionKrF laserA KrF laser was used to ablate a polycrystalline Si target for deposition of Si on MgO and GaAs substrates at room temperature. The deposition was performed in 108mbar, with two types of laser beams: a homogeneous beam being imaged onto ...
1) Technique of pulsed laser ablation deposition 激光烧蚀沉积技术 2) Laser Ablation 激光烧蚀沉积 1. Deosition and Characterization of SiNanomaterial Produced by PulsedLaser Ablation; 激光烧蚀沉积硅基纳米材料及其特性研究 更多例句>> 3) pulsed laser ablation ...
Unhydrogenated diamond-like films were prepared by pulse laser deposition technique at different substrate temperature. 使用脉冲激光沉积技术制备了系列无氢类金刚石薄膜,测量了样品的Raman光谱、光吸收光谱和光致发光光谱,研究了薄膜结构和光致发光性质与制备条件的依赖关系。 更多例句>> 6) pulsed laser deposit...
4) pulsed laser deposition 激光溅射沉积 1. We prepare GaN thin films growing on n-Si(111)substrates by the method of pulsed laser deposition(PLD). 利用激光溅射沉积工艺室温下在n型Si(111)基片上沉积氮化镓(GaN)薄膜,并用原子力显微镜对其表面形貌进行测量,分析了薄膜生长的动力学过程,发现其表面...
1)pulsed laser deposition脉冲激光溅射沉积 2)reactively pulsed laser ablation反应式脉冲激光溅射沉积 1.AlN (Aluminum Nitride) polycrystalline films have been deposited byreactively pulsed laser ablationwith plasmaassisted at low temperature.使用等离子体辅助反应式脉冲激光溅射沉积薄膜的方法在Si(111)和Si(100)...
Target ablation characteristics during pulsed laser deposition of thin films. Zhang Duan-Ming 1)2) Hou Si-Pu 1)2) Guan Li 1)2) Zhong Zhi-Cheng 3) Li Zhi-Hua 1)2) Yang Feng-Xia 1)2) Zheng Ke-Yu 1)2) 1)(Department of Physics,Huazhong University of Science and Technology,Wuhan ...
The kinetic energies of ions in the ablation plume range from a few tenths to several hundred electron volts, adjusting the stress level of films by the defects created in the process. Pulsed laser deposition consists of three subprocesses, according toFig. 8.30. It is necessary to control the...
72, 315 (2000) “Pulsed Laser Deposition of Thin Films”, Chrisey and Hubler (Wiley, New York, 1994) “Laser Ablation and Desorption”, Miller and Haglund (Academic Press, San Diego, 1998) 相关文档 PULSED LASER DEPOSITION OF THIN FILMS - ebooks by …:脉冲激光沉积薄膜的电子书籍… 时间...
Lasers can be used to fabricate thin extended films by condensing on a substrate surface the material that is ablated from a target under the action of laser light. Depending on the specific laser and material parameters, ablation takes place under..
2) High intensity pulsed ion beam ablation plasma deposition(HIPIBAPD) 强流脉冲离子束烧蚀等离子体沉积3) Plasma enhanced pulsed laser deposition (PE-PLD) 等离子体增强脉冲激光溅射沉积(PE-PLD)4) plasma assisted pulsed laser deposition 等离子体辅助脉冲激光沉积 例句>> ...