Quantum imaging can reach a much higher spatial resolution comparing with classicalimaging, even beyond the diffraction limit, which is useful for lithography and other microsystem fabrication technology.It is not a violation of the uncertainty principle, however, a quantum mechanical multi-particle ...
The basic principle of lithography includes the step of transferring ink from a surface having both ink-receptive and ink-repellent areas. Offset printing incorporates an intermediate transfer of the ink. For example, an offset lithographic... KJ Hook,S Litman,J Zaloom - EP 被引量: 16发表: ...
A point of view concerning optical lithography resolution limit when moving into submicron domain is proposed. This is intended as a reevaluation of the classical resolving power definition considering not only the apperture (pattern) size but also its polarity and aspect ratio. Printing of aperture...
Gold disc-shaped antennas of the height of 30 nm and various diameters were prepared using focused ion beam (FIB) lithography. The silicon nitride membranes with the dimensions of 250 × 250 μm2 and the thickness of 30 nm (50 nm for CL studies) were used as the substrate...
et al. Elevating optical activity: Efficient on-edge lithography of three- dimensional starfish metamaterial. Appl. Phys. Lett. 104, 193107-1–193107-4 (2014). 7. Hannam, K., Powell, D. A., Shadrivov, I. V. & Kivshar, Y. S. Broadband chiral metamaterials with large optical activity...
Solid free-form (SSF) techniques for making medical devices for implantation and growth of cells from polymers or polymer/inorganic composites using computer aided design are described. Examples of SFF methods include stereo-lithography ... LG Cima,MJ Cima - US 被引量: 539发表: 1996年 Ghivizza...
for LIDAR, laser machining or lithography narrowband picosecond lasers, e.g. for OPO pumping, Raman or fluorescence spectroscopy and multimodal imaging Questions and Comments from Users 2020-08-25 Is a laser essentially a converter of energy? The author's answer: It can certainly been seed as ...
Wide bandgap materials are prospective candidates for vacuum–ultraviolet–transparent lenses used in optical lithography steppers. Perovskite-like fluorides generally have the wide bandgaps and are therefore preferable materials for the lenses and transparent optical coatings [1]. Alkaline metal based halide...
Electron-Beam Patterning of Vapor-Deposited Solid Anisole The emerging ice lithography (IL) nanofabrication technology differs from conventional electron-beam lithography by working at cryogenic temperatures and u... More by Marco Beleggia,emailprotected,* E-mail: emailprotected M.B..,... 被引量:...
The fabrication of CMOS transistors can be done on the wafer of silicon. The diameter of the wafer ranges from 20mm to 300mm. In this, the Lithography process is the same as the printing press. On every step, different materials can be deposited, etched otherwise patterned. This process is...