The method includes providing a substrate, forming a middle layer comprising a floating additive polymer (FAP) at an upper surface of the middle layer, the FAP chemically bound to a photoacid generator (PAG) and including a fluorine-containing material over the substrate, forming a photoresist ...
US7510817 2005年12月12日 2009年3月31日 Jsr Corporation Photoacid generator, and a polymer with units of 2-alkyladamantyl (meth)acrylate, 3-hydroxyadamantyl (meth)acrylate, 1-alkylcyclopentyl (meth)acrylate or 7-oxo-3,8-methano-6-oxabicyclo(3.2.1)octan-4-yl (meth)acrylate, made with a ...
The photoresist composition comprises as a base resin, the above photoresist polymer together with a photoacid generator and an organic solvent. Such photoresist composition is employed to form a photoresist pattern for a semiconductor device by applying the photoresist composition onto a top portion ...
Inventors Robert Allen David, Phillip Joe Brock, Sean David Burns, Dario Leonardo Goldfarb, David Medeiros, Dirk Pfeiffer, Matt Pinnow, Ratnam Sooriyakumaran, Linda Karin Sundberg Original Assignee International Business Machines Corporation Export Citation BiBTeX, EndNote, RefMan Patent Citations (8)...
A new negative-working and alkaline-developable photosensitive polyimide precursor based on semi-aromatic poly(amic acid)s (4), 4,4′-methylenebis[2,6-bis(hydroxymethyl)]phenol (MBHP) as a cross-linker, and a photoacid generator (5-propylsulfonyloxyimino
8b, the rear sides of the samples with high number of empty filamentary channels are rich of hydroxyl groups (-OH) bounded with –COOH33. The spectra of the top sides of the same samples are very similar to reference (nonirradiated) sample and the rear side of sample IR_10. Increased ...
The compound represented by the formula 1 generates cation initiators when exposed to a UV light in a specific region, and thus is used, for example, as a photoacid initiator, radical initiator and acid catalyst generator in the deprotection of organic compounds. ...
PURPOSE: A positive type polymer resist including a photoacid generator and a manufacturing method of the same are provided to ensure the ultrafine line-width of high resolution and to develop the polymer resist under a commercialized solution such as tetramethyl ammonium hydroxide. CONSTITUTION: A ...
The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process for imaging the photoresist composition
The method includes providing a substrate, forming a middle layer comprising a floating additive polymer (FAP) at an upper surface of the middle layer, the FAP chemically bound to a photoacid generator (PAG) and including a fluorine-containing material over the substrate, forming a photoresist ...