A1 Abstract: Chemical-mechanical polishing (CMP) slurry for oxide films has pH 2-7 and contains an oxidant (I) and a chelant (II). An Independent claim is also included for process for producing a metal wiring contact plug of a semiconductor device by a CMP process using this CMP slurry...
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Power supply: Neutral + Live wire Load power: 2500W (Max) Wireless Frequency 2.4GHZ Company Profile Simeng Electric Power Technology (Hangzhou) Co., Ltd. collaborates with premier professional manufacturers across China. Our esteemed partners boast over two decades of...
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With the support and backing of upgraded infrastructure facility we are able to execute our orders on time with desirable convenience. Our manufacturing unit spread over an area of 6000 sq. ft is well-equipped with various automatic and semi-automatic machinery that are used in the manufacturing ...
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