For this reason, the performance of a connector that displays low optical loss when first installed can dramatically degrade after few mating-demating cycles and catastrophic connector failure due to end-face breakage is likely. We present plasma discharge shaping of cleaved fiber tips to strongly ...
Corona vs. Plasma Treatment For more than 30 years, 3DT LLC has been a leading provider of specialized corona and plasma surface treatments for customers around the world. Our state-of-the-art systems can be used as stand-alone stations, incorporated into new and existing production processes,...
The SIMS profiles show that lots of fluorine atoms could be intro- duced into the poly-Si layer by using CF4 plasma treatment, but not carbon atoms. The SIMS analysis also shows a notably high con- centration of fluorine atoms piling up near the SiO2/poly-Si inter- face, instead of in...
Plasma skin resurfacing treatment can be done at two energy setting levels, high and low. High energy level treatments improve wrinkles, acne scars, etc. Low energy level treatments are effective for superficial treatments like removal of skin discoloration, fine lines, etc. Low energy treatments ...
Sexual enhancement in spinal cord injured patients: Behavioral group treatment Several sexual counseling and education programs exist for the disabled population. Some of these focus upon staff awareness and desentization about sexuality, while others are specifically designed to provide sexual information ...
too. For example, dermatologists and hair replacement experts use PRP injections to treat a type of hair loss called androgenic alopecia, also known as male or female pattern baldness. And some dermatologists provide PRP treatments for the face. (You may have heard these called a “vampire fac...
performing plasma treatment by introducing helicon waves into a workpiece W arranged inside a treatment vessel 14, the inside of each of vacuum vessels 11a and 11b for generating the helicon wave is divided into a plurality of sections by means of a wall face parallel to a magnetic field direc...
Semiconductor device, process for the production thereof and apparatus for microwave plasma treatment Disclosed are a semiconductor device comprising a semiconductor substrate, a first metal connection layers, a first substrate oxide layer having a specific form, and a second connection pattern layer; a...
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In a plasma treating apparatus for carrying out a plasma treatment over a silicon wafer (6) having a protective tape (6a) stuck to a circuit formation face, the silicon wafer (6) is mounted on a mounting surface (3d) which is provided on... Arita, Kiyoshi,Iwai, Tetsuhiro,Terayama, Juni...