Silicon nitride films for applications in optical waveguides have been deposited by plasma-enhanced chemical vapour deposition (PECVD). Index of refraction, deposition rate, buffered HF etch rate and hydrogen c
plasma enhanced chemical vapour depositionsource gaseshigh frequency plasmasubstratesThe ability to deposit a hard, adherent, wear resistant, inert thin coating on complex geometries at temperatures at and below 350 掳C will find application both in the cutting industry and where coatings on cheaper ...
nanostructuresThe effect of various input parameters on the production of carbon nanostructures using a simple microwave plasma-enhanced chemical vapour deposition technique has been investigated. The technique utilises a conventional microwave oven as the microwave energy source. The developed apparatus is ...
7183Accesses 2Altmetric Metrics Abstract We investigated the nucleation and grain growth of graphene grown on Cu through radio frequency plasma-enhanced chemical vapor deposition (RF-PECVD) at different temperatures. A reasonable shielding method for the placement of copper was employed to achieve graphen...
Plasma enhanced chemical vapour deposition Nanocrystalline tungsten carbide thin films 化学气相沉积制备碳化钨纳米晶薄膜 ilib.cn 2. Tribological Characteristics of TiN and TiCN Hard Coatings Prepared by Pulsed D. C. Plasma Enhanced Chemical Vapour Deposition 脉冲直流等离子体辅助化学气相沉积TiN和TiCN薄膜摩擦...
vapour n.[C,U]蒸气,潮气,雾气 plasma n.[U] 1.【生物或医学】血浆 2.【物理】等离子体,等离子气体 chemical adj. 1.与化学有关的,化学的 2.用化学方法制造的,化学作用的 n. 化学制品,化学品 vapo(u)r deposition 蒸法镀敷 vapour ize v. 蒸发 vapour nozzle 蒸汽喷嘴 vapour cooling 蒸发...
vapour n.[C,U]蒸气,潮气,雾气 plasma n.[U] 1.【生物或医学】血浆 2.【物理】等离子体,等离子气体 chemical adj. 1.与化学有关的,化学的 2.用化学方法制造的,化学作用的 n. 化学制品,化学品 voice activated voice-activated a. 声控的 non activated 未活化的 vapo(u)r deposition 蒸法镀敷...
plasma chemical vapour deposition (PCVD) 等离子体化学气相沉积相关短语 vertical accretion (沉积物) 向上增长 supratenuous fold (同沉积褶皱) 上薄褶皱 tetrahedral winding (等离子) 四面体绕组 reppling instability (等离子) 皱纹不稳定性 Madelung's neck (颈部患对称性脂沉积症) 马德隆氏颈 keyhole effect (...
Generally, the deposition of thin films by plasma-enhanced chemical vapour deposition (PECVD) is performed by high-frequency or microwave discharges under vacuum conditions in the range between 0.001 and 1 mbar [1]. However, due to the requirement of a vacuum system and the space limitations def...
A machine (1) for depositing a thin layer of a barrier-effect material inside a container (2) by plasma-enhanced chemical vapor deposition, said machine (1) comprising: a processing unit (4) receiving the container (2) and equipped with an electromagnetic wave generator (11); a precursor ...