网络释义 1. 光沉积法 3.1光沉积法(Photo-deposition) 59 3.2沉淀沉积法(Deposition-precipitation) 60 3.3一氧化碳催化实验 60 第四章 结果与讨论 61 4… etds.ntut.edu.tw|基于17个网页
ultraviolet spectra/ photo-depositionIn this paper, we report the growth of thin tantalum pentoxide films on Si (100) and quartz by photo-induced chemical vapour deposition (photo-CVD) using a 222 nm excimer lamp. The properties of the films formed have been studied using ellipsometry, UV ...
Examines the low temperature photo-oxidation of silicon films by a Xe[sup *][sub 2] excimer lamp operating at a wavelength of 172 nanometer. Comparison of ... JY Zhang,Boyd,W Ian - 《Applied Physics Letters》 被引量: 54发表: 1997年 Rapid photo-deposition of silicon dioxide films using ...
The preparation of supported platinum catalysts through a photochemical approach, namely the liquid phase photo-deposition, has been investigated. Pt catalysts were prepared by irradiating at 25 掳C and 254 nm an alcohol solution of platinum acetylacetonate complex, where two different supports (ceria ...
1) Photo-Deposition Method 光还原沉积法2) photoreduction deposition 光还原沉积 1. In this thesis, the Fe~(3+)doped TiO_2, Ag doped TiO_2, Fe~(3+) and Ag co-doped TiO_2 were prepared by sol-gel method and photoreduction deposition method, whose structure,shape and spectrum ...
A system for depositing photo resist using chemical vapor deposition ( CVD ) onto a semiconductor substrate is disclosed. The system includes a processing chamber and a gas chamber. The gas chamber receives a monomer and supplies sufficient energy for polymerization of the monomer, thereby creating...
During the past several years, infrared and UV absorption spectroscopy and low temperature matrix isolation have been used to probe the photolytic mechanis... JV Gilbert,ML Mulch 被引量: 0发表: 2000年 Photochemical Vapor Deposition of Wide Bandgap III-V Materials: Influence of Photochemically Gene...
The reaction forms desirable bonds which attach to the substrate or previous layer to form an additional new layer.Chau, Robert S.Metz, Matthew V.Hareland, Scott A.US20060252271 * Jul 6, 2006 Nov 9, 2006 Chau Robert S Atomic layer deposition using photo-enhanced bond reconfiguration...
Structural, electrical, and optical properties of transparent conductive oxide ZnO:Al films prepared by dc magnetron reactive sputtering ZnO:Al/(ZaO) films were deposited on quartz substrates by dc magnetron reactive sputtering from a Zn target mixed with Al. The effect of oxygen flow rate, ......
Effect of deposition parameters on properties of ITO films prepared by reactive middle frequency pulsed dual magnetron sputtering At enhanced Oflows an onset of the magnetron target oxidation is discussed as a reason for the decrease of the deposition rate. The presence of water ... AI Rogozin,MV...