在半导体制造中,光刻工艺是一个关键步骤,但有时候会遇到一些令人头疼的缺陷,比如“Peeling Defect”。这种缺陷表现为光阻线条的坍塌,线条倾倒,形貌上非常明显。虽然认识这种缺陷并不难,但了解其形成原因和处理方法却是非常重要的。 Peeling Defect的形成原因 🧐Peeling Defect的形成原因可以从工艺、设备、原材料等多个...
一、光刻中的“Peeling Defect” “Peeling Defect”指的是光阻线的坍塌,光阻“倒了”,这是一种在光刻中很常见的缺陷,从形貌上来看,这类缺陷很明显,就是表现为线条的坍塌,倾倒,如图所示。这类缺陷的认识,是比较简单的,形成原因及处理方式是需要关注的重点。 一、光阻的“Peeling Defect”如何造成? 关于这一块,...
(qq.com) 一、光刻中的“Peeling Defect” “Peeling Defect”指的是光阻线的坍塌,光阻“倒了”,这是一种在光刻中很常见的缺陷,从形貌上来看,这类缺陷很明显,就是表现为线条的坍塌,倾倒,如图所示。这类缺陷的认识,是比较简单的,形成原因及处理方式是需要关注的重点。 倒塌、掀起的光阻线 二、光阻的“Peeling ...
Understanding the mechanism of peeling defect initiation in HAp porous structure contributes to improving resistance to such defects and efficiently fabricating high-performance ceramic porous structures using vat polymerization.Haowen LiangJiaming Bai
需要金币:*** 金币(10金币=人民币1元) 90nm逻辑产品Peeling缺陷的解决方案.pdf 关闭预览 想预览更多内容,点击免费在线预览全文 免费在线预览全文 目 录 摘 要……….………..1 Abstract...3 引 言……….5 第一章光刻基本原理及概述···12 第一节光刻在集成电路中的应用···...
Repeating Defect重复性缺陷 Finger print手指印 Roughness粗糙 Flow type particle扬起状尘埃 Residue...
2.A defect in a paint film or plaster finish which causes the film or finish to lose its adhesion to the substrate, so that it can be removed in strips. McGraw-Hill Dictionary of Architecture and Construction. Copyright © 2003 by McGraw-Hill Companies, Inc. ...
I have recently inspected a crane and was asked about a defect on the metal plating on the Hydraulic rams, to which I did not know. There appears to be a breakdown of the plating on the Hydraulic ram, the crane driver on site said it started as a blister and now there are areas whe...
Our QC controllers could not see this defect on line. However, when we send products to customers we are aware from this situation. We just know that Hot Rolled of this products have stain. Now, if you let me, I would like to know the reason of delamination in galvanizing coil?
侧壁以阻挡在形成无源器件区的外延硅层EPI时,其暴露出来的侧壁硅会对外延硅层EPI的生长进行影响,从而使“Z”字型的台阶结构中的HYB Si生长得较为平整,进而可以抑制SOI器件区和无源器件区中间由于左侧SOI的存在导致边缘交界处硅生成速度较快在边界形成凹凸缺陷bump defect的问题,从而改善了SGC沉积后的peeling defect...