Applied Physics AWen, X.; Traverso, L.M.; Srisungsitthisunti, P.; Xu, X.; Moon, E.E. Optical nanolithography with λ/15 resolution using bowtie aperture array. Appl. Phys. A 2014, 117, 307-311. [CrossRef]Wen, X., Traverso, L.M., Srisungsitthisunti, P., Xu, X. et Moon...
Near-field two-photon nanolithography using an apertureless optical probe. Yin, Xiaobo,Fang, Nicholas,Zhang, Xiang,Martini, Ignacio B.,Schwartz, Benjamin ... X Yin,N Fang,X Zhang,... - 《Applied Physics Letters》 被引量: 216发表: 2002年 Optical near-field based nanomanufacturing Lasers, wi...
被引量: 36发表: 2000年 Nanolithography in microelectronics: A review Approaches owing to which optical lithography has pushed far beyond the Rayleigh-Abbe diffraction limit are considered. Among them are optical proximity ... RP Seisyan - 《Technical Physics》 被引量: 28发表: 2011年 加载更多来源...
TheInstitute of Physicsis situated in new, purpose-built laboratory and teaching space in the building of the Faculty of Science in the Science Park Amsterdam. This location also plays host to numerous national research institutes such as AMOLF (nanophotonics, biomolecular systems, photovoltaics), NIK...
Nano-optics can be used to make a variety of discrete optical devices with functions directly comparable to those of existing bulk optics (although often smaller and more robust). Taking advantage of the unique physics of nano-optics also allows the creation of optical devices with functionality ...
Here, we develop an all-optical technique, termed optothermally-gated photon nudging (OPN), for the versatile manipulation and dynamic patterning of a variety of colloidal particles on a solid substrate at nanoscale accuracy. OPN takes advantage of a thin surfactant layer to optothermally modulate ...
The generation of subdiffraction 2D hollow spots is critical to STED microscopy92and nonlinear nanolithography93. Reducing the inner radius of the 2D hollow spot is of particular importance in further enhancing the spatial resolution. Traditionally, 2D hollow spots can be created by focusing a helical...
Model-Based Optical Proximity Correction for Resist Reflow Process For the patterning of sub-100 nm contact holes, thermal reflow is suggested as a good method of resolving the cost problems of resolution-enhancement techn... SK Kim - 《Japanese Journal of Applied Physics》 被引量: 5发表: 2006...
For operation within the visible band, our design can be physically implemented through various nano- and microfabrication techniques, such as two-photon polymerization-based nanolithography50,61. Furthermore, this complex field imager design also does not include any components that are sensitive to ...
Nanolithography for multi-passband grating filters The placement accuracy and resolution of direct-write patterning tools, in particular the atomic force microscope (AFM), is considered for application to f... RW Cohn - 《Optical Review》 被引量: 23发表: 1999年 Optical response of high-level ban...