Challenges of OPC Model Calibration from SEM Contours. Yuri Granik,I.K. Metrology, Inspection and Process control for Microlithography . 2008Y. Granik, I. Kusnadi, "Challenges of OPC model calibration from SEM contours", Proceedings of the SPIE, vol. 6922-54, 2008....
如果EDA做的是contour-based model,可能gauge会膨胀非常多,指标相对会更客观有效一些。即便如此,最终95分和91分的model相比,哪个更好,并不好直接下定论,最好还是综合判断,比如对比bossung curve。站在EDA工具的角度,是不是也可以开发一个功能,计算每个gauge点的dof和nils,综合打个分呢? 从算法的角度看calibration...
取而代之的是必须依靠庞大的计算机辅助设计软件来进行。这就是基于模型的光学邻近效应修正(Model-based OPC),它使用严格的光学模型和光刻胶光化学反应模型来计算曝光后的图形。 边缘放置误差(EPE) 修正软件首先把设计图形的边缘识别出来,让每一个边缘可以自由移动。软件计算出曝光后的图形并和设计的图形对比,它们之间...
岗位职责: 1. 负责先进逻辑节点OPC开发; 2. 从事SMO优化仿真, OPC model calibration, recipe 开发, 以及mask设计和 整合, tapeout等; 3. 与Litho, Etch, Mask, PIE, DR等相关部门紧密合作,了解工艺需求,给出OPC解决方案; 4. 进行计算光刻先进方法的研究和开发以及EDA tool 的验证等。 岗位要求: 1. 负责...
1.负责先进逻辑节点OPC开发; 2.从事SMO优化仿真,OPC model calibration,recipe开发,以及mask设计和 整合,tapeout等; 3.与Litho,Etch,Mask,PIE,DR等相关部门紧密合作,了解工艺需求,给出OPC解决方案; 4.进行计算光刻先进方法的研究和开发以及EDA tool的验证等。
2009 Calibration of Physical Resist Models: Methods, Usability, and Predictive Power 物理电阻模型的校准:方法、可用性和预测能力 摘要:我们讨论了抗蚀剂模型在各个方面的校准方法,并评估了由此产生的预测准确性。该研究是在广泛的OPC数据集上进行的,该数据集包括通过45 nm技术节点的浸没光刻获得的数千个CD值。
Model No.︰ SST-DN3-OPC Brand Name︰ MOLEX Country of Origin︰ United States Unit Price︰ CNY ¥ 1 / pc Minimum Order︰ 1 pc Share on: Facebook Twitter Pinterest Total 453 Related Items Prev 327 328 329 330 331 Next Product Description Woodhead Industries, Inc. applicom® I SST™...
If the predicted contours are within a predetermined tolerance of the experimentally determined contours, then the model calibration is complete, step S114. However, if the predicted contours are not within the predetermined tolerance, then the weight of each term associated with each eigen vector ...
However, the run time for model calibration and OPC compensation are long by rigorous models and they are not suitable for full chip applications. In this paper, we demonstrate an accurate and rapid method that considers wafer topography proximity effects using a kernel based model. We also ...
The results of calibration and verification of the process model for a polysilicon layer produced by the technology of Department of Microtechnology (DMT), Scientific Research Institute of System Analysis, Russian Academy of Sciences, in compliance with the 0.25 渭m design standards are reported. The...