Doubtnut is No.1 Study App and Learning App with Instant Video Solutions for NCERT Class 6, Class 7, Class 8, Class 9, Class 10, Class 11 and Class 12, IIT JEE prep, NEET preparation and CBSE, UP Board, Bihar Board, Rajasthan Board, MP Board, Telangana Board etc ...
(\:T=1+\frac{i}{{\omega\:}_{0}}\frac{\partial\:}{\partial\:t}\)in front ofPNLis responsible for the self-steepening of the pulse.\(\:{\beta\:}_{0}=\frac{{n}_{0}{\omega\:}_{0}}{c}\)is the wavenumber, and n0≡n(ω0) is the linear index of refraction at ...
model.MC.interfaceNormals[-] A 2D array of dimension (2 x (nxnynz)) where local interface normal vector angles are stored. Each column contains the theta, phi angles for one voxel's interface normal vector. Used for calculated of refraction and reflection on oblique and curved interfaces bet...
Spectral wave transformation model for simulating refraction-diffraction with strongly reflecting coastal structures[J]. Acta Oceanologica Sinica, 2011, (2): 25-32. doi: 10.1007/s13131-011-0102-y [13] LI Jie, QIAN Hongbao, LI hai, LIU Yu, GAO Zhiyi. Numerical study of sea waves created ...
There are various types of meta- surfaces that control refraction [9], reflection [10], pho- toluminescence [11], fluorescence [12–14], waveplates [15], and beam splitters [16]. Polarization state is one of the fundamental and important properties of light that can be controlled by ...
McKenzie and Westphal [13] derived formulas for amplification and Snell’s Laws for refraction and reflection of acoustic, vorticity, and entropy waves interacting with a shock and applied the results to the amplification of small disturbances in the solar wind on a passage through the bow shock...
(NA) of an objective lens assembly is defined as NA=n sin(&thgr;) where n is the index of refraction of the image space and &thgr; is the angle of the marginal ray (the highest ray entering the objective lens assembly) at the image space. Image space refers to the short or near...
Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers uses an optical device made from a material having a high index of refraction and held in very close proximity to the wafer. The optical device may either be a...
and a reflective layer disposed on the surface of said exit pupil expander; said exit pupil expander and said reflective layer being disposed within an envelope, said exit pupil expander and said envelope having the same, or nearly the same, coefficient of refraction; wherein some light impinging...
19. The PSM photomask of claim 14, the transparent substrate having a first index of refraction n, the radiation having a first wavelength λ, and the transparent substrate having a first thickness under the first aperture and a second thickness under the second aperture, wherein the difference...